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1.发明授权Apparatus for projecting an electron beam along a curved path having variable impedance 失效用于沿着具有可变阻抗的弯曲路径投影电子束的装置
公开(公告)号：US3204096A
公开(公告)日：1965-08-31
申请号：US20850462
申请日：1962-07-09
Applicant: STAUFFER CHEMICAL CO
Inventor： ANDERSON EMMETT R , HANKS CHARLES W
IPC: H01J37/24 , H01J37/305
CPC classification number: H01J37/24 , H01J37/305
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