Substrate processing apparatus and driving method thereof

    公开(公告)号:US11984345B2

    公开(公告)日:2024-05-14

    申请号:US18135017

    申请日:2023-04-14

    CPC classification number: H01L21/68742 H01L21/68785

    Abstract: The present disclosure is related to a substrate processing apparatus. The substrate processing apparatus may include a chuck including a plurality of pin holes and a plurality of lift pins positioned to rise and fall through the plurality of pin holes. The substrate processing apparatus may include a lift plate configured to raise and lower the lift pins. The plurality of lift pins may include a lift pin having a rod shape configured to move up and down in a pin hole of the plurality of pin holes, a flexure coupled to a lower portion of the lift pin, a weight body positioned underneath the lift plate, and a weight string connecting the flexure and the weight body. The lift plate may include a string hole through which the weight string passes through.

    LAYER DEPOSITION APPARATUS AND LAYER DEPOSITION METHOD

    公开(公告)号:US20250137136A1

    公开(公告)日:2025-05-01

    申请号:US18919340

    申请日:2024-10-17

    Abstract: A layer deposition apparatus includes a process chamber configured to provides a space for processing a substrate, the process chamber including an upper chamber and a lower chamber that define an inner space; a substrate support disposed within the process chamber and configured to support the substrate; a lamp heating portion disposed above the upper chamber outside the process chamber and including a plurality of light sources configured to irradiate light onto the substrate through the upper chamber; and an interference thin layer pattern disposed on an upper surface of the upper chamber and configured to reflect at least a portion of light from the plurality of light sources.

    THIN-FILM DEPOSITION APPARATUS
    3.
    发明公开

    公开(公告)号:US20240218561A1

    公开(公告)日:2024-07-04

    申请号:US18515664

    申请日:2023-11-21

    CPC classification number: C30B25/16 C30B25/12

    Abstract: A thin-film deposition apparatus includes: a housing; a chamber located within the housing and providing an internal space; a platform disposed within the chamber and configured to support a substrate; a reflector disposed within the housing and disposed outside the chamber; a light source disposed between opposing walls of the reflector and configured to radiate light onto the substrate; a light receiver disposed within the housing, spaced apart from the light source with a portion of the reflector therebetween, and having a hole through which light emitted from the substrate is introduced; an optical cable connected to the light receiver and extending to the outside of the housing; and a sensor disposed outside the housing, connected to the optical cable, and configured to measure a temperature of the substrate by analyzing light transmitted from the optical cable.

    Substrate processing apparatus and driving method thereof

    公开(公告)号:US11651990B2

    公开(公告)日:2023-05-16

    申请号:US16712413

    申请日:2019-12-12

    CPC classification number: H01L21/68742 H01L21/68785

    Abstract: The present disclosure is related to a substrate processing apparatus. The substrate processing apparatus may include a chuck including a plurality of pin holes and a plurality of lift pins positioned to rise and fall through the plurality of pin holes. The substrate processing apparatus may include a lift plate configured to raise and lower the lift pins. The plurality of lift pins may include a lift pin having a rod shape configured to move up and down in a pin hole of the plurality of pin holes, a flexure coupled to a lower portion of the lift pin, a weight body positioned underneath the lift plate, and a weight string connecting the flexure and the weight body. The lift plate may include a string hole through which the weight string passes through.

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