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公开(公告)号:US10401301B2
公开(公告)日:2019-09-03
申请号:US15940011
申请日:2018-03-29
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Seongkeun Cho , Akinori Okubo , Tae Hyun Kim , Sangwoo Bae , Janghwi Lee
Abstract: An optical test system includes a stage region to accommodate an object to be tested, a first incident optical system which changes a first polarization state of a first light beam to a second polarization state and provide the first light beam in the second polarization state to the stage region in a first direction at a first incident angle which is not a right angle, a second incident optical system which changes a third polarization state of a second light beam to a fourth polarization state and inputs the second light beam in the fourth polarization state to the stage region in a second direction at a second incident angle which is not a right angle, and a main optical system to detect a first reflected light beam reflected from the stage region at a first reflection angle different from the first and second incident.
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公开(公告)号:US20220170792A1
公开(公告)日:2022-06-02
申请号:US17365592
申请日:2021-07-01
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sungho Jang , Jungchul Lee , Jinseob Kim , Gwangsik Park , Minhwan Seo , Janghwi Lee , Wondon Joo , Jiyoung Chu , Daehoon Han
Abstract: Provided is a hyperspectral imaging (HSI) apparatus. The HSI apparatus includes: a first slit plate configured to introduce an output beam; a first aspherical mirror configured to reflect the introduced output beam; a first grating having a planar reflective surface, the first grating configured to generate a plurality of first split beams by splitting the output beam after being reflected by the first aspherical mirror; and a first camera configured to detect the plurality of first split beams.
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公开(公告)号:US20250137136A1
公开(公告)日:2025-05-01
申请号:US18919340
申请日:2024-10-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hunyong Park , Yeontae Kim , Janghwi Lee , Sangwoo Bae , Jungchul Lee
IPC: C23C16/48
Abstract: A layer deposition apparatus includes a process chamber configured to provides a space for processing a substrate, the process chamber including an upper chamber and a lower chamber that define an inner space; a substrate support disposed within the process chamber and configured to support the substrate; a lamp heating portion disposed above the upper chamber outside the process chamber and including a plurality of light sources configured to irradiate light onto the substrate through the upper chamber; and an interference thin layer pattern disposed on an upper surface of the upper chamber and configured to reflect at least a portion of light from the plurality of light sources.
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公开(公告)号:US20240218561A1
公开(公告)日:2024-07-04
申请号:US18515664
申请日:2023-11-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Janghwi Lee , Yeontae Kim , Junbum Park , Hunyong Park , Suhwan Park , Sangwoo Bae , Motoshi Sakai , Wondon Joo , Jaeho Jin
Abstract: A thin-film deposition apparatus includes: a housing; a chamber located within the housing and providing an internal space; a platform disposed within the chamber and configured to support a substrate; a reflector disposed within the housing and disposed outside the chamber; a light source disposed between opposing walls of the reflector and configured to radiate light onto the substrate; a light receiver disposed within the housing, spaced apart from the light source with a portion of the reflector therebetween, and having a hole through which light emitted from the substrate is introduced; an optical cable connected to the light receiver and extending to the outside of the housing; and a sensor disposed outside the housing, connected to the optical cable, and configured to measure a temperature of the substrate by analyzing light transmitted from the optical cable.
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公开(公告)号:US11898912B2
公开(公告)日:2024-02-13
申请号:US17365592
申请日:2021-07-01
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sungho Jang , Jungchul Lee , Jinseob Kim , Gwangsik Park , Minhwan Seo , Janghwi Lee , Wondon Joo , Jiyoung Chu , Daehoon Han
CPC classification number: G01J3/2823 , G01J3/021 , G01J3/04 , G01J3/24 , G01J2003/2826
Abstract: Provided is a hyperspectral imaging (HSI) apparatus. The HSI apparatus includes: a first slit plate configured to introduce an output beam; a first aspherical mirror configured to reflect the introduced output beam; a first grating having a planar reflective surface, the first grating configured to generate a plurality of first split beams by splitting the output beam after being reflected by the first aspherical mirror; and a first camera configured to detect the plurality of first split beams.
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