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公开(公告)号：US11898912B2
公开(公告)日：2024-02-13
申请号：US17365592
申请日：2021-07-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sungho Jang , Jungchul Lee , Jinseob Kim , Gwangsik Park , Minhwan Seo , Janghwi Lee , Wondon Joo , Jiyoung Chu , Daehoon Han
CPC classification number: G01J3/2823 , G01J3/021 , G01J3/04 , G01J3/24 , G01J2003/2826
Abstract: Provided is a hyperspectral imaging (HSI) apparatus. The HSI apparatus includes: a first slit plate configured to introduce an output beam; a first aspherical mirror configured to reflect the introduced output beam; a first grating having a planar reflective surface, the first grating configured to generate a plurality of first split beams by splitting the output beam after being reflected by the first aspherical mirror; and a first camera configured to detect the plurality of first split beams.
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公开(公告)号：US20250012556A1
公开(公告)日：2025-01-09
申请号：US18403801
申请日：2024-01-04
Applicant: Samsung Electronics Co., Ltd.
Inventor： Younguk Jin , Wookrae Kim , Jinseob Kim , Jinyong Kim , Garam Choi , Daehoon Han
IPC: G01B9/02 , G01B9/02001 , G01B9/02056
Abstract: A semiconductor measurement apparatus includes lighting unit; a light receiving unit; and a control unit configured to: generate a prediction equation representing the original image, where the prediction equation is based on a plurality of elements of a Mueller matrix, approximate each of the plurality of elements of the Mueller matrix to a polynomial including bases of a Zernike polynomial and coefficients, generate optimization coefficients based on a sum of the coefficients and a difference between the prediction equation and the original image, determine whether an optimization condition is satisfied based on the optimization coefficients and a minimum value, and select a dimension based on the optimization coefficients and the bases when the optimization condition is satisfied.
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公开(公告)号：US20240288265A1
公开(公告)日：2024-08-29
申请号：US18372391
申请日：2023-09-25
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jinyong Kim , Yasuhiro Hidaka , Wookrae Kim , Ingi Kim , Jinseob Kim
IPC: G01B11/02
CPC classification number: G01B11/02 , G01B2210/56
Abstract: Provided is a semiconductor measurement apparatus that includes: a lighting unit comprising a light source, and a light modulator configured to decompose a light output by the light source into a plurality of wavelength bands and generate an output light of at least two selected wavelength bands; a first optical unit comprising an illumination polarizing element disposed in a path of the output light; a second optical unit comprising a beam splitter, an objective lens configured to allow light having passed through the first optical unit to be incident onto a sample, and a self-interference generator disposed on a path of a reflected light; a sensor configured to output an original image representing an interference pattern of light having passed through the self-interference generator; and a controller configured to process the original image and determine a selected critical dimension of a structure included in the sample.
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Patent Agency Ranking
公开(公告)号：US20220170792A1
公开(公告)日：2022-06-02
申请号：US17365592
申请日：2021-07-01
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sungho Jang , Jungchul Lee , Jinseob Kim , Gwangsik Park , Minhwan Seo , Janghwi Lee , Wondon Joo , Jiyoung Chu , Daehoon Han
Abstract: Provided is a hyperspectral imaging (HSI) apparatus. The HSI apparatus includes: a first slit plate configured to introduce an output beam; a first aspherical mirror configured to reflect the introduced output beam; a first grating having a planar reflective surface, the first grating configured to generate a plurality of first split beams by splitting the output beam after being reflected by the first aspherical mirror; and a first camera configured to detect the plurality of first split beams.
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公开(公告)号：US12228499B2
公开(公告)日：2025-02-18
申请号：US18111229
申请日：2023-02-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang Jung , Yasuhiro Hidaka , Mitsunori Numata , Wookrae Kim , Jinseob Kim , Myungjun Lee
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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公开(公告)号：US12002698B2
公开(公告)日：2024-06-04
申请号：US17174731
申请日：2021-02-12
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Myungjun Lee , Changhyeong Yoon , Wookrae Kim , Jaehwang Jung , Jinseob Kim
CPC classification number: H01L21/67288 , G01N21/4788 , G01N21/8851 , G01N21/9501 , G01N2201/021 , G01N2201/0636 , G06N20/00
Abstract: Provided are a diffraction-based metrology apparatus having high measurement sensitivity, a diffraction-based metrology method capable of accurately performing measurement on a semiconductor device, and a method of manufacturing a semiconductor device using the metrology method. The diffraction-based metrology apparatus includes a light source that outputs a light beam, a stage on which an object is placed, a reflective optical element that irradiates the light beam onto the object through reflection, such that the light beam is incident on the object at an inclination angle, the inclination angle being an acute angle, a detector that detects a diffracted light beam that is based on the light beam reflected and diffracted by the object and a processor that measures a 3D pupil matrix for the diffracted light beam and analyze the object based on the 3D pupil matrix.
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公开(公告)号：US20230400404A1
公开(公告)日：2023-12-14
申请号：US18154990
申请日：2023-01-16
Applicant: Samsung Electronics Co., Ltd.
Inventor： Garam Choi , Wookrae Kim , Jinseob Kim , Jinyong Kim , Sungho Jang , Daehoon Han
CPC classification number: G01N21/21 , G01B11/24 , G01B2210/56
Abstract: A semiconductor measurement apparatus includes an illumination unit including a light source and at least one illumination polarization element, a light receiving unit including at least one light-receiving polarization element disposed on a path of light reflected by a sample, and an image sensor positioned to receive light passing through the at least one light-receiving polarization element and configured to output an original image, and a control unit configured to determine, by processing the original image, a selected critical dimension among critical dimensions of a structure included in a region of the sample. The control unit is configured to obtain a plurality of sample images by selecting regions of the original image in which a peak due to interference appears, to determine a plurality of elements included in a Mueller matrix using the plurality of sample images, and to determine the selected critical dimension based on the plurality of elements.
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公开(公告)号：US11604136B2
公开(公告)日：2023-03-14
申请号：US17204059
申请日：2021-03-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jaehwang Jung , Yasuhiro Hidaka , Mitsunori Numata , Wookrae Kim , Jinseob Kim , Myungjun Lee
Abstract: Provided is a pupil ellipsometry measurement apparatus configured to measure an object, the pupil ellipsometry measurement apparatus including a stage configured to support the object to be measured, a light source unit configured to generate and output light, an irradiation optical system configured to focus the light from the light source unit on the object, a first detector configured to detect an image of reflected light from the object on an imaging plane, a self-interference generator (SIG) configured to generate self-interference with respect to the reflected light, a second detector configured to detect a hologram image of interference light of the SIG on a pupil plane, and a processor configured to reconstruct reflectance information based on the hologram image, and measure the object.
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