Abstract:
A communication apparatus transmits an authentication frame to an authentication apparatus and receives a response frame for response to the authentication frame from the authentication apparatus so that an authentication process is performed for the communication apparatus by the authentication apparatus. In the communication apparatus, a transmitting section transmits an authentication frame to the authentication apparatus using a multicast address as a transmission destination address, and if a reception determining section determines that the response frame is not received from the authentication apparatus, a transmission destination address changing section changes the transmission destination address from the multicast address to a broadcast address, and the transmitting section transmits the authentication frame that has the transmission destination address changed to the broadcast address to the authentication apparatus.
Abstract:
According to the present invention, when at least one of a target braking/driving force and a vehicle target yaw moment required to a vehicle cannot be achieved by a braking/driving forces of wheels, a target braking/driving force after a modification and a target yaw moment after a modification are calculated to be values attainable by the braking/driving forces of the wheels. When the magnitudes of the target braking/driving force after a modification and the target yaw moment after the modification exceed the corresponding limit value, these magnitudes are limited to the limit values. Alternatively, when the magnitudes of rates of change of the target braking/driving force after a modification and the target yaw moment after the modification exceed the corresponding limited rates of change, these magnitudes of the rates of change are limited to the limited rates of change.
Abstract:
A liquid crystal module is provided. A rectangular frame includes an upper bezel, a lower bezel, a left bezel and a right bezel which are coupled to each other and encloses four peripheral edges of a liquid crystal panel. A rib is disposed at a rear side of each coupling portion between adjacent bezels to prevent the adjacent bezels which are coupled to each other from falling down inwardly.
Abstract:
A laser processing apparatus for processing a multitude of portions to be processed in an area to be processed in a subject W to be processed, including a laser device, a focusing or imaging means for laser beams provided by the laser device, and an arranging means for arranging the subject W to be processed, in which the subject W to be processed and the focusing or imaging means are fixed, and the subject to be processed is processed while relatively shifting the laser beams and the focusing or imaging means so that the focusing or imaging means is irradiated from different areas in the laser beam, inside and outside the area to be processed, and that cumulative laser beam irradiation time during the processing of each of the multitude of portions to be processed is equalized.
Abstract:
The communication system supports reservation of network resources. The base stations relay packets among the terminals, and perform priority control based on the priority set to the packets. In the terminal, the communication-managing table stores communication information of own terminal and a partner thereof. The packet-transmitting unit, setting priority to the packets, transmits the packets. When link condition of own terminal change, the link-managing unit updates, in order to prevent from quality deterioration of the other terminals, the priority of each of the packets whose source terminal is the own terminal.
Abstract:
The invention provides a semiconductor device having less defectives in shape of a patterned wiring layer even in a case of having a wiring layer for which patterning is required to be carried out over a longer period of etching time, and a method for producing the same. By carrying out dry etching using a fluorine-based gas with a photoresist 17a used as a mask, an auxiliary mask 15a is formed by patterning the insulation membrane. Next, by carrying out dry etching using a chlorine-based gas using the auxiliary mask 15a and the remaining photoresist 17a as masks, wiring 13a is formed by patterning the wiring layer 13. In the second etching, the auxiliary mask 15a is scarcely etched. Therefore, if the thickness of the photoresist 17a is equivalent to that in the prior arts, it is possible to pattern a thicker wiring layer 13 than in the prior arts.
Abstract:
A resource request is continuously accepted within predetermined time by a resource management device that comprises a resource request accepting unit, a measuring unit, and an allocating unit. The resource request accepting unit accepts a resource request that is necessary for communication. The resource request includes priority of communication. The measuring unit measures the accepting time when the resource request accepting unit accepts the resource request. The allocating unit allocates resource to the resource request accepted in accepting time based on priority. As a result, suitable resource allocation according to the priority instead of the order of arrival is realized.
Abstract:
A valve gear with a cylinder suspending mechanism of an internal combustion engine, whose entire valve gear mechanism is downsized by efficiently arranging the configuration of the valve gear including the cylinder suspending mechanism. A low-speed drive rocker arm and a high-speed drive rocker arm are disposed in front and at the rear of an intake driven rocker arm so that pistons of low-speed and high-speed cylinder portions arranged side by side in the intake driven rocker arm may be pressed by operating operation arm portions extending from the respective drive rocker arms, to thereby arrange the low-speed and high-speed cylinder portions and the low-speed and high-speed drive rocker arms around the intake driven rocker arm to gather in one place.
Abstract:
The invention provides a semiconductor device having less defectives in shape of a patterned wiring layer even in a case of having a wiring layer for which patterning is required to be carried out over a longer period of etching time, and a method for producing the same. By carrying out dry etching using a fluorine-based gas with a photoresist 17a used as a mask, an auxiliary mask 15a is formed by patterning the insulation membrane. Next, by carrying out dry etching using a chlorine-based gas using the auxiliary mask 15a and the remaining photoresist 17a as masks, wiring 13a is formed by patterning the wiring layer 13. In the second etching, the auxiliary mask 15a is scarcely etched. Therefore, if the thickness of the photoresist 17a is equivalent to that in the prior arts, it is possible to pattern a thicker wiring layer 13 than in the prior arts.
Abstract:
Synthetic zeolite is stabilized to water by soaking it in a buffered acid solution for a prolonged time. The stabilized synthetic zeolite does not exhibit alkalinity when it is dispersed in water at room temperature for 24 hours or more, and exhibits improved flowability and almost constant ratios among Na, Al and O along the depth direction from the surface of the zeolite particles.