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    Transmitting apparatus and control method therefor and receiving apparatus and control method therefor
    2.
    发明授权
    Transmitting apparatus and control method therefor and receiving apparatus and control method therefor 有权
    发送装置及其控制方法及其接收装置及其控制方法

    公开(公告)号：US07295761B2

    公开(公告)日：2007-11-13

    申请号：US10144810

    申请日：2002-05-15

    Applicant: Kunihiro Minoshima ,  Hidemi Usuba ,  Shinsuke Nishimura ,  Kinya Ono

    Inventor： Kunihiro Minoshima ,  Hidemi Usuba ,  Shinsuke Nishimura ,  Kinya Ono

    IPC: H04N5/76 ,  H04N7/00

    CPC classification number: H04N21/4305 ,  H04N5/775 ,  H04N21/4307 ,  H04N21/43632

    Abstract: There are provided the controlling methods of the transmitting apparatus and the receiving apparatus, which cancel the flow control to execute the normal reproduction by the user who looks at the warning display or in response to the reception of the flow control cancel signal from the receiver side. Otherwise, there are provided the controlling methods of the transmitting apparatus and the receiving apparatus, which cancel the flow control reception to execute the normal reception without the buffer if the contents with the video is reproduced.

    Abstract translation: 提供了发送装置和接收装置的控制方法，其取消流量控制以执行正在观看警告显示的用户的正常再现或响应于从接收机侧接收到流量控制取消信号 。 否则，如果再现具有视频的内容，则提供发送装置和接收装置的控制方法，其消除流量控制接收以执行没有缓冲器的正常接收。

    Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus
    5.
    发明授权
    Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus 有权
    带电粒子束曝光装置的放电测量方法，带电粒子束曝光装置的阶段相位测量方法，带电粒子束曝光装置的控制方法和带电粒子束曝光装置

    公开(公告)号：US07439525B2

    公开(公告)日：2008-10-21

    申请号：US11501824

    申请日：2006-08-10

    Applicant: Shinsuke Nishimura

    Inventor： Shinsuke Nishimura

    IPC: G21K5/10

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/282

    Abstract: A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation position on a specimen through the opening portion of the mask, measuring the first irradiation position in accordance with a specimen stage coordinate system, moving the mask stage to a second stage position, measuring the second stage position of the mask stage, irradiating a second charged particle beam to a second irradiation position on the specimen through the opening portion of the mask measuring the second irradiation position in accordance with the specimen stage coordinate system, and calculating a demagnification of the charged particle beam exposure apparatus from the first and second stage positions and the first and second irradiation positions.

    Abstract translation: 用于测量带电粒子束曝光装置的缩小的方法包括根据掩模台坐标系测量掩模台的第一级位置，通过开口部分将第一带电粒子束照射到样品上的第一照射位置 ，根据试样台坐标系测量第一照射位置，将掩模台移动到第二台位置，测量掩模台的第二台位置，将第二带电粒子束照射到第二照射位置上 所述试样通过所述掩模的开口部，根据所述试样台坐标系测量所述第二照射位置，并计算所述带电粒子束曝光装置从所述第一和第二台位置以及所述第一和第二照射位置的缩小。

    Transmitting apparatus and control method therefor and receiving apparatus and control method therefor
    7.
    发明申请
    Transmitting apparatus and control method therefor and receiving apparatus and control method therefor 有权
    发送装置及其控制方法及其接收装置及其控制方法

    公开(公告)号：US20080091854A1

    公开(公告)日：2008-04-17

    申请号：US11905031

    申请日：2007-09-27

    Applicant: Kunihiro Minoshima ,  Hidemi Usuba ,  Shinsuke Nishimura ,  Kinya Ono

    Inventor： Kunihiro Minoshima ,  Hidemi Usuba ,  Shinsuke Nishimura ,  Kinya Ono

    IPC: G06F3/00

    CPC classification number: H04N21/4305 ,  H04N5/775 ,  H04N21/4307 ,  H04N21/43632

    Abstract: There are provided the controlling methods of the transmitting apparatus and the receiving apparatus, which cancel the flow control to execute the normal reproduction by the user who looks at the warning display or in response to the reception of the flow control cancel signal from the receiver side. Otherwise, there are provided the controlling methods of the transmitting apparatus and the receiving apparatus, which cancel the flow control reception to execute the normal reception without the buffer if the contents with the video is reproduced.

    Abstract translation: 提供了发送装置和接收装置的控制方法，其取消流量控制以执行正在观看警告显示的用户的正常再现或响应于从接收机侧接收到流量控制取消信号 。 否则，如果再现具有视频的内容，则提供发送装置和接收装置的控制方法，其消除流量控制接收以执行没有缓冲器的正常接收。

    Electron beam irradiation apparatus and electron beam drawing apparatus
    10.
    发明授权
    Electron beam irradiation apparatus and electron beam drawing apparatus 有权
    电子束照射装置和电子束描绘装置

    公开(公告)号：US08362427B2

    公开(公告)日：2013-01-29

    申请号：US13240242

    申请日：2011-09-22

    Applicant: Shinsuke Nishimura ,  Munehiro Ogasawara

    Inventor： Shinsuke Nishimura ,  Munehiro Ogasawara

    IPC: H01J37/26

    CPC classification number: H01J37/244

    Abstract: According to one embodiment, an electron beam irradiation apparatus comprises an objective lens configured to irradiate a specimen surface with an electron beam, an electron detector which is provided between the objective lens and the specimen surface and which is configured to detect reflected electrons or secondary electrons emitted from the specimen surface, and an antireflection mechanism which is provided between the electron detector and the specimen surface. The antireflection mechanism has a plurality of holes following spiral trajectories of reflected electrons or secondary electrons emitted from the specimen surface and is configured to prevent the reflected electrons or secondary electrons from being re-reflected toward the specimen surface and to direct a part of the reflected electrons or secondary electrons to the electron detector.

    Abstract translation: 根据一个实施例，电子束照射装置包括被配置为用电子束照射样本表面的物镜，设置在物镜和样本表面之间并被配置为检测反射电子或二次电子的电子检测器 从样品表面发射的反射机构，以及设置在电子检测器和试样表面之间的防反射机构。 防反射机构具有从被检体表面发射的反射电子或二次电子的螺旋轨迹之后的多个孔，并且被配置为防止反射的电子或二次电子朝向试样表面再反射并且引导反射的一部分 电子或二次电子到电子检测器。

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