公开(公告)号：US06394023B1

公开(公告)日：2002-05-28

申请号：US09536263

申请日：2000-03-27

Applicant: Steven C. Crocker

Inventor： Steven C. Crocker

IPC: G01D2100

CPC classification number: C23C16/4401 ,  C23C14/564

Abstract: A recyclable process kit part is provided with a visible mark. After the part undergoes a cleaning process that removes deposited material therefrom, the part can be determined to be within tolerance, based on the mark's visibility. More specifically, the recyclable process kit part is made of a material, and has a first surface that has a first elevation. A visual mark is formed in the first surface, and extends to a second elevation, wherein the distance between the first elevation and the second elevation is adapted such that the mark is visible until an amount of the material is removed from the part so as to make the part nearly out of tolerance.

Abstract translation: 可回收的工艺组件部件具有可见标记。 在部件进行清除处理之后，从其中去除沉积的材料，可以根据标记的可视性将部件确定在公差范围内。 更具体地，可回收处理套件部分由材料制成，并且具有第一高度的第一表面。 在第一表面中形成视觉标记并延伸到第二高度，其中第一高度和第二高度之间的距离适于使得标记是可见的，直到从该部分去除材料的量，以便 使部分几乎摆脱宽容。

公开(公告)号：US06699375B1

公开(公告)日：2004-03-02

申请号：US09609015

申请日：2000-06-29

Applicant: Steven C. Crocker

Inventor： Steven C. Crocker

IPC: C23C1434

CPC classification number: H01J37/32871 ,  C23C14/564 ,  C23C16/4404 ,  H01J37/32504

Abstract: One embodiment relates to an apparatus for sputtering material onto a workpiece, the apparatus including a vacuum chamber and a target disposed in the vacuum chamber, the target comprising a material to be deposited onto said workpiece. The apparatus also includes a holder for the workpiece and at least one recyclable process kit component positioned to accumulate material sputtered from the target. The process kit component includes a base metal layer including titanium and an outer layer of titanium nitride. The titanium nitride layer acts as an etch stop during recycling of the process kit component. The process kit component may include a part selected from the group of a shield, pedestal, shutter, coil, collimator, deposition ring, cover ring, and clamp ring.

Abstract translation: 一个实施例涉及用于将材料溅射到工件上的装置，该装置包括设置在真空室中的真空室和靶，该靶包括待沉积到所述工件上的材料。 该设备还包括用于工件的保持器和至少一个可循环使用的处理套件组件，其被定位成积聚从目标溅射的材料。 工艺套件组件包括包含钛和氮化钛外层的基底金属层。 氮化钛层在处理套件组件的再循环期间用作蚀刻停止。 处理套件组件可以包括从屏蔽，基座，快门，线圈，准直器，沉积环，盖环和夹紧环组中选择的部件。