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    GAS GENERATION APPARATUS
    1.
    发明申请
    GAS GENERATION APPARATUS 审中-公开

    公开(公告)号：US20190259637A1

    公开(公告)日：2019-08-22

    申请号：US16347703

    申请日：2016-12-19

    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation

    Inventor： Yoichiro TABATA ,  Yuji ONO ,  Takasho SATO

    IPC: H01L21/67 ,  C01B13/11

    Abstract: Six gas generator units each including a gas generator, one unit of multiple AC power supply section that supplies six high frequency AC voltages to the six gas generator units, one unit of gas control section that controls raw material gas and output gas in the six gas generator units, and one unit of control/operation section constituting section that performs an AC power control operation to allow six high frequency AC voltages having desired electric energy, independent from each other, to be supplied. The six gas generator units, one unit of multiple AC power supply section, one unit of gas control section, and one unit of control/operation section constituting section are integrally provided.

    OZONE GENERATING METHOD
    2.
    发明申请
    OZONE GENERATING METHOD 审中-公开

    公开(公告)号：US20180327264A1

    公开(公告)日：2018-11-15

    申请号：US15773650

    申请日：2015-12-08

    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation

    Inventor： Takasho SATO ,  Yoichiro TABATA ,  Yuji ONO

    IPC: C01B13/11

    CPC classification number: C01B13/11

    Abstract: As a metal compound layer provided between a dielectric and a ground electrode of an ozone generator, there is used a metal compound satisfying the condition (1) the metal compound is not a substance promoting ozone decomposition, the condition (2) the metal compound is not a conductor, the condition (3) the band gap of the metal compound layer is in the range of 2.0 to 4.0 (eV), and the condition (4) the hole potential of a valence band portion formed in the excited state of the metal compound layer is larger than the binding potential (1.25 (eV)) of an oxygen molecule. In addition, as ozone generation processing are executed under an environment in which various ozone decomposition suppression requirements for suppressing a decomposition amount of ozone are imposed on the ozone generator.

    OZONE GAS USAGE SYSTEM
    4.
    发明申请
    OZONE GAS USAGE SYSTEM 审中-公开

    公开(公告)号：US20200207620A1

    公开(公告)日：2020-07-02

    申请号：US16637377

    申请日：2017-08-09

    Applicant: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION

    Inventor： Yoichiro TABATA ,  Yuji ONO ,  Takasho SATO

    IPC: C01B13/11 ,  B01J35/00

    Abstract: A small-scale application apparatus including an ozone generation apparatus configured to generate ozone gas, the application apparatus being configured to perform ozone usage processing. The ozone generation apparatus includes a load-resonant high-frequency step-up transformer configured to obtain a stepped-up high-frequency voltage and an ozone generator configured to receive the stepped-up high-frequency voltage as an operating voltage to generate the ozone gas having an ozone concentration of at least 200 g/m3 from raw gas containing oxygen gas. The application apparatus receives the ozone gas under a pressure environment of at least 0.2 MPa.

    GAS JETTING APPARATUS FOR FILM FORMATION APPARATUS
    5.
    发明申请
    GAS JETTING APPARATUS FOR FILM FORMATION APPARATUS 审中-公开

    公开(公告)号：US20170275758A1

    公开(公告)日：2017-09-28

    申请号：US15514367

    申请日：2014-10-29

    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation

    Inventor： Yoichiro TABATA ,  Kensuke WATANABE ,  Shinichi NISHIMURA

    IPC: C23C16/455 ,  C23C16/503

    Abstract: The present invention provides a gas jetting apparatus for a film formation apparatus. The gas jetting apparatus is capable of uniformly jetting, even onto a treatment-target object having a high-aspect-ratio groove, a gas into the groove. The gas jetting apparatus (100) according to the present invention includes a gas jetting cell unit (23) for rectifying a gas and jetting the rectified gas into the film formation apparatus (200). The gas jetting cell unit (23) has a fan shape internally formed with a gap (d0) serving as a gas route. A gas in a gas dispersion supply unit (99) enters from a wider-width side of the fan shape into the gap (d0), and, due to the fan shape, the gas is rectified, accelerated, and output from a narrower-width side of the fan shape into the film formation apparatus (200).

    ACTIVE GAS GENERATION APPARATUS
    10.
    发明申请
    ACTIVE GAS GENERATION APPARATUS 审中-公开

    公开(公告)号：US20200343078A1

    公开(公告)日：2020-10-29

    申请号：US16764898

    申请日：2018-01-10

    Applicant: Toshiba Mitsubishi-Electric Industrial Systems Corporation

    Inventor： Kensuke WATANABE ,  Shinichi NISHIMURA ,  Ren ARITA ,  Yoshihito YAMADA ,  Yoichiro TABATA

    IPC: H01J37/32 ,  C23C16/452 ,  C23C16/50 ,  C23C16/455

    Abstract: The present invention has features (1) to (3). The feature (1) is that “an active gas generation electrode group is formed in such a manner that a ground side electrode component supports a high-voltage side electrode component”. The feature (2) is that “stepped parts are provided in a discharge space outside region of a dielectric electrode in the high-voltage side electrode component, and project downward, and by a formation height of these stepped parts, the gap length of a discharge space is defined”. The feature (3) is that “the high-voltage side electrode component and the ground side electrode component are formed to have the thickness of a discharge space formation region relatively thin and the thickness of a discharge space outside region relatively thick”.

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