公开(公告)号：US20020075426A1

公开(公告)日：2002-06-20

申请号：US10014482

申请日：2001-12-14

Applicant: Taiwan Nano Electro-Optical Technology Co., Ltd.

Inventor： Ying-Fu Wang ,  Jung-Chih Tsai

IPC: G02F001/1335

CPC classification number: G02B6/0013 ,  G02B6/0051

Abstract: This invention provides a backlight device which includes at least: a photo conductive plate used for visible light to go through; a point light source, which is beside the photo conductive plate, used for producing visible light; a first diffusing top, which is beside the photo conductive plate, used for diffusing the visible light from the point light source to the lighting method of uniform line light source; a second diffusing top, which is on the bottom of the photo conductive plate, used for diffusing the visible light from the first diffusing top to the lighting method of uniform top light source; a diffusing reflect objective, which is below the photo conductive plate, used for diffusing the light and then reflecting the diffused light to the photo conductive plate.

Abstract translation: 本发明提供一种背光装置，其至少包括：用于可见光通过的光导板; 光导电板旁边的点光源用于产生可见光; 在光导电板旁边的第一扩散顶部用于将来自点光源的可见光扩散到均匀线光源的照明方法; 位于光导电板底部的第二漫射顶，用于将来自第一漫射顶部的可见光扩散到均匀顶光源的照明方法; 在光导体板下面的扩散反射物体用于漫射光，然后将漫射光反射到光导电板。

公开(公告)号：US20020041441A1

公开(公告)日：2002-04-11

申请号：US09911559

申请日：2001-07-24

Applicant: Taiwan Nano Electro-Optical Technology Co., Ltd

Inventor： Ying-Fu Wang

IPC: G02B005/02 ,  G02B013/20 ,  G02B005/04 ,  G02B007/18

CPC classification number: G02B5/00 ,  G02B6/0036 ,  G02B6/0065

Abstract: An optical element includes an optical body having a surface formed with a microstructure set which includes at least two microstructure relieves. At least one of the microstructure relieves has a configuration different from another one of the microstructure relieves. At least one of the microstructure relieves is defined by 3 to 5 faces.

Abstract translation: 光学元件包括具有形成有包括至少两个微结构缓冲的微结构组的表面的光学体。 微结构缓冲器中的至少一个具有不同于另一微结构缓冲件的构造。 至少一个微结构缓冲由3到5个面定义。

公开(公告)号：US20030178547A1

公开(公告)日：2003-09-25

申请号：US10404257

申请日：2003-03-31

Applicant: Taiwan Nano Electro-Optical Technology Co., Ltd.

Inventor： Ying-Fu Wang ,  Yi-Tang Wang

IPC: B29C033/00 ,  G03B021/56 ,  G02B005/02 ,  G02B013/20 ,  G03F005/00 ,  G03F007/16 ,  G03F007/20 ,  C25D001/00 ,  B05D001/00 ,  B05D005/06

CPC classification number: G03F7/0015

Abstract: A process for producing an article with a microstructure includes the steps of forming a primary relief structure on a surface of a substrate, applying a photo resist on the substrate, exposing part of the photo resist using a photo mask so as to form a microstructure pattern, developing the microstructure pattern in the exposed photo resist, thereby allowing access to a part of the primary relief structure from the photo resist, and thereby forming a patterned surface with a microstructure relief that is bounded by the exposed part of the primary relief structure and by remainder of the photo resist on the substrate, and forming a metal layer on the patterned surface to form the article having the microstructure with a profile corresponding to the microstructure relief on the patterned surface.