公开(公告)号：US20140373783A1

公开(公告)日：2014-12-25

申请号：US14484598

申请日：2014-09-12

Applicant: TOKYO ELECTRON LIMITED

Inventor： Ikuo SAWADA ,  Masato MORISHIMA ,  Yukimasa SAITO

IPC: C23C16/513

CPC classification number: C23C16/513 ,  C23C16/24 ,  C23C16/4412 ,  C23C16/45574 ,  C23C16/50 ,  C23C16/509 ,  H01J37/32091 ,  H01J37/3244 ,  H01J37/32568 ,  H01L31/1824 ,  Y02E10/545 ,  Y02P70/521

Abstract: A film forming device forms a thin film on a substrate by reacting reaction gases in a process vessel. Electrode portions each oriented vertically are arranged to be spaced from each other in a horizontal direction. By applying high-frequency powers having different phases to adjacent electrode portions, a strong plasma generation space is formed above the substrate placed on a mounting table, while a weak plasma generation space is formed in the gap between the electrode portions and the substrate. A first reaction gas is supplied to the strong plasma generation space and a second reaction gas that forms the thin film by reacting with the active species of the first reaction gas is supplied to the weak plasma generation space. The reaction gases in the weak plasma generation space are discharged through exhaust channels.

Abstract translation: 成膜装置通过使处理容器中的反应气体反应而在基板上形成薄膜。 垂直取向的电极部分在水平方向上彼此间隔开。 通过对相邻电极部分施加具有不同相位的高频电力，在放置在安装台上的基板的上方形成强等离子体产生空间，同时在电极部分和基板之间的间隙中形成微弱的等离子体产生空间。 将第一反应气体供应到强等离子体产生空间，并且通过与第一反应气体的活性物质反应形成薄膜的第二反应气体被供给到弱等离子体产生空间。 弱等离子体产生空间中的反应气体通过排气通道排出。

公开(公告)号：US20140256157A1

公开(公告)日：2014-09-11

申请号：US14281242

申请日：2014-05-19

Applicant: Tokyo Electron Limited

Inventor： Ikuo SAWADA ,  Sumie Nagaseki ,  Kyoko Ikeda

IPC: H01L21/02

CPC classification number: H01L21/02271 ,  C23C16/4486 ,  H01L21/02181 ,  H01L21/31612 ,  H01L21/31645 ,  H01L21/3185

Abstract: A vaporizing unit, in supplying a gas material produced by vaporizing a liquid material onto a substrate to conduct a film forming process, can vaporize the liquid material with high efficiency to suppress generation of particles. With the vaporizing unit, positively or negatively charged bubbles, which have a diameter of 1000 nm or less, are produced in the liquid material, and the liquid material is atomized to form a mist of the liquid material. Further, the mist of the liquid material is heated and vaporized. The fine bubbles are uniformly dispersed in advance in the liquid material, so that very fine and uniform mist particles of the liquid material are produced when the liquid material is atomized, which makes heat exchange readily conducted. By vaporizing the mist of the liquid material, vaporization efficiency is enhanced, and generation of particles can be suppressed.

Abstract translation: 蒸发单元在将通过将液体材料蒸发到基板上以进行成膜处理而生成的气体材料的情况下，可以高效率地蒸发液体材料，以抑制颗粒的产生。 利用蒸发单元，在液体材料中产生直径为1000nm以下的带正电荷或带负电荷的泡沫，液体材料被雾化以形成液体材料的雾。 此外，液体材料的雾被加热和蒸发。 微细气泡预先均匀地分散在液体材料中，从而当液体材料雾化时产生液体材料的非常细小且均匀的雾状颗粒，这使得热交换容易进行。 通过蒸发液体材料的雾，提高了蒸发效率，并且可以抑制颗粒的产生。