公开(公告)号：US11114321B2

公开(公告)日：2021-09-07

申请号：US16104335

申请日：2018-08-17

Applicant: Tokyo Electron Limited

Inventor： Sylvain Ballandras ,  Thierry Laroche ,  Kimihiro Matsuse ,  Jacques Berg ,  Tomohide Minami

IPC: G01K11/22 ,  H01L21/67 ,  G01K13/00 ,  G01K3/14 ,  H03H9/02 ,  H03H9/25 ,  H03H1/00 ,  H01J37/32 ,  H03H3/08 ,  H03H9/42 ,  G01D5/48 ,  G01K1/02 ,  G01K11/26

Abstract: An apparatus and method for real-time sensing of properties in industrial manufacturing equipment are described. The sensing system includes first plural sensors mounted within a processing environment of a semiconductor device manufacturing system, wherein each sensor is assigned to a different region to monitor a physical or chemical property of the assigned region of the manufacturing system, and a reader system having componentry configured to simultaneously and wirelessly interrogate the plural sensors. The reader system uses a single high frequency interrogation sequence that includes (1) transmitting a first request pulse signal to the first plural sensors, the first request pulse signal being associated with a first frequency band, and (2) receiving uniquely identifiable response signals from the first plural sensors that provide real-time monitoring of variations in the physical or chemical property at each assigned region of the system.

公开(公告)号：US20210343560A1

公开(公告)日：2021-11-04

申请号：US17378190

申请日：2021-07-16

Applicant: Tokyo Electron Limited

Inventor： Sylvain Ballandras ,  Thierry Laroche ,  Kimihiro Matsuse ,  Jacques Berg ,  Tomohide Minami

IPC: H01L21/67 ,  G01K11/22 ,  G01K13/00 ,  G01K3/14 ,  H03H9/02 ,  H03H9/25 ,  H03H1/00 ,  H01J37/32 ,  H03H3/08 ,  H03H9/42 ,  G01D5/48 ,  G01K1/02 ,  G01K11/26

Abstract: An apparatus and method for real-time sensing of properties in industrial manufacturing equipment are described. The sensing system includes first plural sensors mounted within a processing environment of a semiconductor device manufacturing system, wherein each sensor is assigned to a different region to monitor a physical or chemical property of the assigned region of the manufacturing system, and a reader system having componentry configured to simultaneously and wirelessly interrogate the plural sensors. The reader system uses a single high frequency interrogation sequence that includes (1) transmitting a first request pulse signal to the first plural sensors, the first request pulse signal being associated with a first frequency band, and (2) receiving uniquely identifiable response signals from the first plural sensors that provide real-time monitoring of variations in the physical or chemical property at each assigned region of the system.

公开(公告)号：US20190057887A1

公开(公告)日：2019-02-21

申请号：US16104335

申请日：2018-08-17

Applicant: Tokyo Electron Limited

Inventor： Sylvain Ballandras ,  Thierry Laroche ,  Kimihiro Matsuse ,  Jacques Berg ,  Tomohide Minami

IPC: H01L21/67 ,  G01K11/22 ,  G01K13/00 ,  G01K3/14 ,  H03H9/02 ,  H03H9/42 ,  H03H9/25 ,  H03H1/00 ,  H01J37/32 ,  H03H3/08

Abstract: An apparatus and method for real-time sensing of properties in industrial manufacturing equipment are described. The sensing system includes first plural sensors mounted within a processing environment of a semiconductor device manufacturing system, wherein each sensor is assigned to a different region to monitor a physical or chemical property of the assigned region of the manufacturing system, and a reader system having componentry configured to simultaneously and wirelessly interrogate the plural sensors. The reader system uses a single high frequency interrogation sequence that includes (1) transmitting a first request pulse signal to the first plural sensors, the first request pulse signal being associated with a first frequency band, and (2) receiving uniquely identifiable response signals from the first plural sensors that provide real-time monitoring of variations in the physical or chemical property at each assigned region of the system.