公开(公告)号：US20210333707A1

公开(公告)日：2021-10-28

申请号：US17238541

申请日：2021-04-23

Applicant: Tokyo Electron Limited

Inventor： Takuya MIURA ,  Kouichirou TANAKA ,  Shogo TAKAHASHI ,  Yusuke MIYAKUBO ,  Kentaro YOSHIHARA

IPC: G03F7/00

Abstract: A nozzle unit for a liquid treatment apparatus that performs a liquid treatment on a substrate using a liquid, includes a first gas nozzle having a discharge flow path for allowing a first gas to flow through the discharge flow path and a first discharge port for discharging the first gas flowing through the discharge flow path toward a surface of the substrate, wherein the first discharge port is formed so as to extend in a first direction along the surface, and wherein a width of the discharge flow path in the first direction increases as the discharge flow path approaches the first discharge port, so that the first gas is discharged radially from the first discharge port.

公开(公告)号：US20240361687A1

公开(公告)日：2024-10-31

申请号：US18769841

申请日：2024-07-11

Applicant: Tokyo Electron Limited

Inventor： Takuya MIURA ,  Kouichirou TANAKA ,  Shogo TAKAHASHI ,  Yusuke MIYAKUBO ,  Kentaro YOSHIHARA

IPC: G03F7/00

CPC classification number: G03F7/0025

Abstract: A nozzle unit for a liquid treatment apparatus that performs a liquid treatment on a substrate using a liquid, includes a first gas nozzle having a discharge flow path for allowing a first gas to flow through the discharge flow path and a first discharge port for discharging the first gas flowing through the discharge flow path toward a surface of the substrate, wherein the first discharge port is formed so as to extend in a first direction along the surface, and wherein a width of the discharge flow path in the first direction increases as the discharge flow path approaches the first discharge port, so that the first gas is discharged radially from the first discharge port.