公开(公告)号：US20020176928A1

公开(公告)日：2002-11-28

申请号：US10152562

申请日：2002-05-23

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tomohide Minami ,  Shinichi Sugimoto ,  Takahiro Kitano ,  Jun Ookura ,  Hiroaki Kurishima

IPC: B05D003/12

CPC classification number: H01L21/67253 ,  B05D1/005 ,  B05D1/26 ,  H01L21/6715

Abstract: When a coating film is formed on a substrate, the inplane uniformity of the thickness of the coating film is enhanced to improve through put. Above the substrate, there are provided main and auxiliary nozzles separately movable, and monitoring means for monitoring the state of the surface of the substrate to detect the occurrence of an uncoated region on the surface of the substrate. On the basis of previously prepared coating data, a coating liquid is spirally applied on the substrate by the main nozzle. Then, if the monitoring means detects the occurrence of the uncoated region in a coated region in which the coating liquid has been applied by the main nozzle, a control part detects whether it is required to supply the coating liquid to the uncoated region. If it is required, the coating liquid is supplied to the uncoated region by the auxiliary nozzle. On the other hand, the portion of occurrence of the uncoated region has been grasped by the control part. If the uncoated region is continuously detected at the same place with respect to two substrates, it is determined that the setting of coating data is erroneous, and this is modified.

Abstract translation: 当在基板上形成涂膜时，涂膜厚度的平面均匀性得到提高，可以通过放置来改善。 在基板上方提供分开移动的主喷嘴和辅助喷嘴，以及用于监测基板表面的状态以检测基板表面上未涂覆区域的发生的监控装置。 基于预先制备的涂料数据，涂料液体通过主喷嘴螺旋地施加在基材上。 然后，如果监视装置检测到在主喷嘴施加了涂布液的涂布区域中未涂覆区域的发生，则控制部检测是否需要将涂布液供给到未涂覆区域。 如果需要，则通过辅助喷嘴将涂布液供给到未涂覆区域。 另一方面，未涂覆区域的发生部分已被控制部分掌握。 如果相对于两个基板在相同的位置连续地检测未涂覆区域，则确定涂布数据的设置是错误的，并且这被修改。

公开(公告)号：US20030172542A1

公开(公告)日：2003-09-18

申请号：US10384571

申请日：2003-03-11

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

IPC: F26B013/30

CPC classification number: H01L21/67109 ,  H01L21/67034 ,  Y10S134/902

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

Abstract translation: 低压干燥器在低压下干燥在其上涂布涂布溶液的基材。 干燥机包括安装基板台的气密室，以将基板放置在其上; 扩散板，其设置为具有间隙放置在基板台上的基板，用于将存在于间隙中的气体朝向外部排出，扩散板具有与基板大致相同或更大的尺寸; 衬底温度调节器，安装在衬底台中，用于调节衬底的温度; 以及用于对气密室进行减压的减压机构。 扩散板具有温度调节器，用于使温度调节在扩散板的第一区域和第二区域之间具有温度差，第一区域面向基板的中心区域，第二区域在第一区域的外部，并且包括 面向衬底的外部区域的区域。

公开(公告)号：US20040241320A1

公开(公告)日：2004-12-02

申请号：US10885577

申请日：2004-07-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tomohide Minami ,  Shinichi Sugimoto ,  Takahiro Kitano ,  Jun Ookura ,  Hiroaki Kurishima

IPC: B05D001/00 ,  B05C011/00

CPC classification number: H01L21/67253 ,  B05D1/005 ,  B05D1/26 ,  H01L21/6715

Abstract: When a coating film is formed on a substrate, the inplane uniformity of the thickness of the coating film is enhanced to improve through put. Above the substrate, there are provided main and auxiliary nozzles separately movable, and monitoring means for monitoring the state of the surface of the substrate to detect the occurrence of an uncoated region on the surface of the substrate. On the basis of previously prepared coating data, a coating liquid is spirally applied on the substrate by the main nozzle. Then, if the monitoring means detects the occurrence of the uncoated region in a coated region in which the coating liquid has been applied by the main nozzle, a control part detects whether it is required to supply the coating liquid to the uncoated region. If it is required, the coating liquid is supplied to the uncoated region by the auxiliary nozzle. On the other hand, the portion of occurrence of the uncoated region has been grasped by the control part. If the uncoated region is continuously detected at the same place with respect to two substrates, it is determined that the setting of coating data is erroneous, and this is modified.

Abstract translation: 当在基板上形成涂膜时，涂膜厚度的平面均匀性得到提高，可以通过放置来改善。 在基板上方提供分开移动的主喷嘴和辅助喷嘴，以及用于监测基板表面的状态以检测基板表面上未涂覆区域的发生的监控装置。 基于预先制备的涂料数据，涂料液体通过主喷嘴螺旋地施加在基材上。 然后，如果监视装置检测到在主喷嘴施加了涂布液的涂布区域中未涂覆区域的发生，则控制部检测是否需要将涂布液供给到未涂覆区域。 如果需要，则通过辅助喷嘴将涂布液供给到未涂覆区域。 另一方面，未涂覆区域的发生部分已被控制部分掌握。 如果相对于两个基板在相同的位置连续地检测未涂覆区域，则确定涂布数据的设置是错误的，并且这被修改。

公开(公告)号：US20040216325A1

公开(公告)日：2004-11-04

申请号：US10859088

申请日：2004-06-03

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tomohide Minami ,  Hiroshi Shinya ,  Takahiro Kitano

IPC: F26B013/30

CPC classification number: H01L21/67109 ,  H01L21/67034 ,  Y10S134/902

Abstract: A low-pressure dryer dries a substrate applied a coating solution thereon at low pressure. The dryer includes an airtight chamber installing a substrate table to place the substrate thereon; a diffuser plate, provided as facing the substrate placed on the substrate table with a gap, for discharging gas existing in the gap toward outside, the diffuser plate having a size almost the same as or larger than the substrate; a substrate-temperature adjuster, installed in the substrate table, for adjusting a temperature of the substrate; and a decompression mechanism for decompressing the airtight chamber. The diffuser plate has a temperature adjuster for making temperature adjustments to have a temperature difference between a first region and a second region of the diffuser plate, the first region facing a center region of the substrate, the second region being outside the first region and including a region facing an outer region of the substrate.

公开(公告)号：US20020150679A1

公开(公告)日：2002-10-17

申请号：US10122390

申请日：2002-04-16

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tomohide Minami ,  Shinichi Sugimoto ,  Takahiro Kitano ,  Jun Ookura ,  Hiroaki Kurishima

IPC: B05D003/12 ,  B05D001/02

CPC classification number: H01L21/6715 ,  B05D1/005 ,  B05D1/02

Abstract: A coating solution is sprayed on a rotating wafer held horizontally from a nozzle provided above the wafer while the nozzle is travelling over the wafer from a wafer center to a wafer outer area, thus spirally spraying the coating solution on the wafer. The nozzle stops when the coating solution has reached the wafer outer area and the coating solution is sprayed in circle on the wafer outer area while the wafer is rotating. A coating solution including a component of a coating film and a solvent may be sprayed on a first area to be coated of the wafer and the coating solution and a solvent for the coating film may be sprayed on a second edge area located outside the first area of the wafer.

Abstract translation: 当喷嘴从晶片中心移动到晶片外部区域上时，将涂布溶液喷涂在从设置在晶片上方的喷嘴水平保持的旋转晶片上，从而将涂布溶液螺旋地喷涂在晶片上。 当涂层溶液已经到达晶片外部区域时，喷嘴停止，并且在晶片旋转的同时将涂布溶液圆形喷涂在晶片外部区域上。 包括涂膜和溶剂的组分的涂布溶液可以喷涂在晶片和涂布溶液的待涂覆的第一区域上，并且用于涂膜的溶剂可以喷涂在位于第一区域外部的第二边缘区域 的晶片。

公开(公告)号：US20010033895A1

公开(公告)日：2001-10-25

申请号：US09840179

申请日：2001-04-24

Applicant: Tokyo Electron Limited

Inventor： Tomohide Minami ,  Takahiro Kitano ,  Yuji Matsuyama

IPC: B05D003/12 ,  B05C011/02

CPC classification number: H01L21/6715 ,  B05D1/005 ,  B05D3/0466 ,  B05D3/0486 ,  G03F7/162

Abstract: The present invention is a film forming method for forming a film of a coating solution on a substrate, comprising the steps of spreading the coating solution supplied to a center of the substrate by rotating the substrate, and supplying solvent vapor of the coating solution to the coating solution spread over the substrate while rotating the substrate to thin the film of the coating solution formed on the substrate. Accordingly, it becomes possible that the film of the coating solution which is formed by spreading the coating solution over the substrate is maintained at a low viscosity, and that the film can be further thinned. The necessary quantity of the coating solution can be also reduced. Moreover, since solvent vapor is supplied onto the coating film, by controlling the supply quantity or the supply position of the solvent vapor, the uniformity of the coating solution film can be obtained, and the thickness of the coating solution film can be controlled.

Abstract translation: 本发明是一种在基板上形成涂布液的膜的成膜方法，其特征在于，包括以下步骤：通过旋转所述基板将供给到所述基板的中心的涂布液扩散，并将所述涂布液的溶剂蒸气供给到 涂布溶液在衬底上铺展，同时旋转衬底以使形成在衬底上的涂布溶液的薄膜变薄。 因此，通过将涂布液涂布在基板上而形成的涂布液的膜保持低粘度，并且可以进一步减薄膜。 所需量的涂布溶液也可以减少。 此外，由于溶剂蒸气被供给到涂膜上，通过控制溶剂蒸气的供给量或供给位置，可以获得涂布液的均匀性，并且可以控制涂布液膜的厚度。