-
公开(公告)号:US09841319B2
公开(公告)日:2017-12-12
申请号:US14083594
申请日:2013-11-19
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Tse-Yi Lu
CPC classification number: G01J1/4204 , G01J1/0209 , G01J1/0492 , H01L27/305
Abstract: A light detecting device is provided, comprising a substrate having a patterned metal layer formed thereon; a dielectric layer formed on the substrate, first pixel element formed on the dielectric layer, and a second pixel element. The dielectric layer at least has a first trench, and the first trench is positioned below the level of the first pixel element. The second pixel element comprises a buried portion formed correspondingly to the first trench, and an upper portion formed on the buried portion. The upper portion of the second pixel element is positioned at the same level of the first pixel element.
-
公开(公告)号:US20150136958A1
公开(公告)日:2015-05-21
申请号:US14083594
申请日:2013-11-19
Applicant: UNITED MICROELECTRONICS CORP.
Inventor: Tse-Yi Lu
CPC classification number: G01J1/4204 , G01J1/0209 , G01J1/0492 , H01L27/305
Abstract: A light detecting device is provided, comprising a substrate having a patterned metal layer formed thereon; a dielectric layer formed on the substrate, first pixel element formed on the dielectric layer, and a second pixel element. The dielectric layer at least has a first trench, and the first trench is positioned below the level of the first pixel element. The second pixel element comprises a buried portion formed correspondingly to the first trench, and an upper portion formed on the buried portion. The upper portion of the second pixel element is positioned at the same level of the first pixel element.
Abstract translation: 提供了一种光检测装置,包括其上形成有图案化金属层的基板; 形成在基板上的电介质层,形成在电介质层上的第一像素元件和第二像素元件。 电介质层至少具有第一沟槽,并且第一沟槽位于第一像素元件的电平之下。 第二像素元件包括对应于第一沟槽形成的掩埋部分和形成在掩埋部分上的上部。 第二像素元件的上部位于第一像素元件的相同高度。
-