公开(公告)号：US20150005525A1

公开(公告)日：2015-01-01

申请号：US14368046

申请日：2012-12-21

Applicant: UNIVERSITEIT GENT

Inventor： Matthias Ide ,  Pascal Van Der Voort ,  Patrick Sandra ,  Frederic Lynen

IPC: C07F7/18

CPC classification number: C07F7/1804 ,  B01J20/283 ,  B01J20/286 ,  B01J2220/82

Abstract: The present invention relates to novel silica materials, precursors thereof and the preparation thereof. The compounds may be used for a variety of applications, including chromatography and catalysis.

Abstract translation: 本发明涉及新型二氧化硅材料及其前体及其制备方法。 该化合物可用于各种应用，包括色谱和催化。

公开(公告)号：US08968864B2

公开(公告)日：2015-03-03

申请号：US13622141

申请日：2012-09-18

Applicant: IMEC ,  Universiteit Gent

Inventor： Frederik Goethals ,  Pascal Van Der Voort ,  Isabel Van Driessche ,  Mikhail Baklanov

IPC: B32B3/26 ,  H01L23/58 ,  H01L21/31 ,  H01L21/3105 ,  H01L21/02

CPC classification number: H01L21/31058 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02362 ,  H01L21/3105 ,  Y10T428/249978 ,  Y10T428/249979 ,  Y10T428/249981

Abstract: A method for at least partially sealing a porous material is provided, comprising forming a sealing layer onto the porous material by applying a sealing compound comprising oligomers wherein the oligomers are formed by ageing a precursor solution comprising cyclic carbon bridged organosilica and/or bridged organosilanes. The method is especially designed for low k dielectric porous materials to be incorporated into semiconductor devices.

Abstract translation: 提供了一种用于至少部分地密封多孔材料的方法，包括通过施加包含低聚物的密封化合物形成密封层到所述多孔材料上，所述密封化合物通过使包含环状碳桥连的有机硅和/或桥连的有机硅烷的前体溶液老化而形成所述低聚物。 该方法特别设计用于要并入半导体器件的低k电介质多孔材料。

公开(公告)号：US09181282B2

公开(公告)日：2015-11-10

申请号：US14368046

申请日：2012-12-21

Applicant: UNIVERSITEIT GENT

Inventor： Matthias Ide ,  Pascal Van Der Voort ,  Patrick Sandra ,  Frederic Lynen

IPC: C07F7/08 ,  C07F7/18 ,  B01J20/283 ,  B01J20/286

CPC classification number: C07F7/1804 ,  B01J20/283 ,  B01J20/286 ,  B01J2220/82

Abstract: The present invention relates to novel silica materials, precursors thereof and the preparation thereof. The compounds may be used for a variety of applications, including chromatography and catalysis.

Abstract translation: 本发明涉及新型二氧化硅材料及其前体及其制备方法。 该化合物可用于各种应用，包括色谱和催化。

公开(公告)号：US20130075876A1

公开(公告)日：2013-03-28

申请号：US13622141

申请日：2012-09-18

Applicant: IMEC ,  Universiteit Gent

Inventor： Frederik Goethals ,  Pascal Van Der Voort ,  Isabel Van Driessche ,  Mikhail Baklanov

IPC: H01L21/312 ,  H01L23/29

CPC classification number: H01L21/31058 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02362 ,  H01L21/3105 ,  Y10T428/249978 ,  Y10T428/249979 ,  Y10T428/249981

Abstract: A method for at least partially sealing a porous material is provided, comprising forming a sealing layer onto the porous material by applying a sealing compound comprising oligomers wherein the oligomers are formed by ageing a precursor solution comprising cyclic carbon bridged organosilica and/or bridged organosilanes. The method is especially designed for low k dielectric porous materials to be incorporated into semiconductor devices.

Abstract translation: 提供了一种用于至少部分地密封多孔材料的方法，包括通过施加包含低聚物的密封化合物形成密封层到所述多孔材料上，所述密封化合物通过使包含环状碳桥连的有机硅和/或桥连的有机硅烷的前体溶液老化而形成所述低聚物。 该方法特别设计用于要并入半导体器件的低k电介质多孔材料。