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公开(公告)号:US11814526B2
公开(公告)日:2023-11-14
申请号:US18079085
申请日:2022-12-12
Applicant: UNIVERSITY OF IOWA RESEARCH FOUNDATION
Inventor: Elise Lin Cheng , C. Allan Guymon , Marian R. Hansen , Braden Leigh
IPC: C09D133/10 , A61L27/16 , A61L27/34 , A61L29/04 , A61L29/08 , A61L31/04 , A61L31/10 , C08K5/11 , C09D5/16 , C09D133/26 , C09D151/08
CPC classification number: C09D133/10 , A61L27/16 , A61L27/34 , A61L29/041 , A61L29/085 , A61L31/048 , A61L31/10 , C08K5/11 , C09D5/1675 , C09D133/26 , C09D151/085 , A61L2300/404 , A61L2420/08
Abstract: Durable, anti-fouling, crosslinked zwitterionic coatings that are grafted to the surface of a substrate through covalent bonding are disclosed. When exposed to a light source, zwitterionic monomers react with a crosslinker and with activated radicals at the surface of the substrate, simultaneously forming the crosslinked zwitterionic coating and anchoring it to the surface of the substrate. Photomasking techniques can be used to micropattern the zwitterionic coatings. The zwitterionic coatings can be applied to a variety of substrates, including medical devices and systems.
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公开(公告)号:US20240084163A1
公开(公告)日:2024-03-14
申请号:US18507969
申请日:2023-11-13
Applicant: UNIVERSITY OF IOWA RESEARCH FOUNDATION
Inventor: Elise Lin Cheng , C. Allan Guymon , Marlan R. Hansen , Braden Leigh
IPC: C09D133/10 , A61L27/16 , A61L27/34 , A61L29/04 , A61L29/08 , A61L31/04 , A61L31/10 , C08K5/11 , C09D5/16 , C09D133/26 , C09D151/08
CPC classification number: C09D133/10 , A61L27/16 , A61L27/34 , A61L29/041 , A61L29/085 , A61L31/048 , A61L31/10 , C08K5/11 , C09D5/1675 , C09D133/26 , C09D151/085 , A61L2300/404 , A61L2420/08
Abstract: Durable, anti-fouling, crosslinked zwitterionic coatings that are grafted to the surface of a substrate through covalent bonding are disclosed. When exposed to a light source, zwitterionic monomers react with a crosslinker and with activated radicals at the surface of the substrate, simultaneously forming the crosslinked zwitterionic coating and anchoring it to the surface of the substrate. Photomasking techniques can be used to micropattern the zwitterionic coatings. The zwitterionic coatings can be applied to a variety of substrates, including medical devices and systems.
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公开(公告)号:US11525069B2
公开(公告)日:2022-12-13
申请号:US16312448
申请日:2017-06-24
Applicant: UNIVERSITY OF IOWA RESEARCH FOUNDATION
Inventor: Elise Lin Cheng , C. Allan Guymon , Marian R. Hansen , Braden Leigh
IPC: C09D133/10 , A61L27/16 , A61L27/34 , A61L29/04 , A61L29/08 , A61L31/04 , A61L31/10 , C08K5/11 , C09D5/16 , C09D133/26 , C09D151/08
Abstract: Durable, anti-fouling, crosslinked zwitterionic coatings that are grafted to the surface of a substrate through covalent bonding are disclosed. When exposed to a light source, zwitterionic monomers react with a crosslinker and with activated radicals at the surface of the substrate, simultaneously forming the crosslinked zwitterionic coating and anchoring it to the surface of the substrate. Photomasking techniques can be used to micropattern the zwitterionic coatings. The zwitterionic coatings can be applied to a variety of substrates, including medical devices and systems.
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公开(公告)号:US12116498B2
公开(公告)日:2024-10-15
申请号:US18507969
申请日:2023-11-13
Applicant: UNIVERSITY OF IOWA RESEARCH FOUNDATION
Inventor: Elise Lin Cheng , C. Allan Guymon , Marlan R. Hansen , Braden Leigh
IPC: C09D133/10 , A61L27/16 , A61L27/34 , A61L29/04 , A61L29/08 , A61L31/04 , A61L31/10 , C08K5/11 , C09D5/16 , C09D133/26 , C09D151/08
CPC classification number: C09D133/10 , A61L27/16 , A61L27/34 , A61L29/041 , A61L29/085 , A61L31/048 , A61L31/10 , C08K5/11 , C09D5/1675 , C09D133/26 , C09D151/085 , A61L2300/404 , A61L2420/08
Abstract: Durable, anti-fouling, crosslinked zwitterionic coatings that are grafted to the surface of a substrate through covalent bonding are disclosed. When exposed to a light source, zwitterionic monomers react with a crosslinker and with activated radicals at the surface of the substrate, simultaneously forming the crosslinked zwitterionic coating and anchoring it to the surface of the substrate. Photomasking techniques can be used to micropattern the zwitterionic coatings. The zwitterionic coatings can be applied to a variety of substrates, including medical devices and systems.
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公开(公告)号:US20200308440A1
公开(公告)日:2020-10-01
申请号:US16312448
申请日:2017-06-24
Applicant: UNIVERSITY OF IOWA RESEARCH FOUNDATION
Inventor: Elise Lin Cheng , C. Allan Guymon , Marlan R. Hansen , Braden Leigh
IPC: C09D133/10 , C09D5/16 , C08K5/11 , A61L27/34 , A61L29/08 , A61L31/10 , C09D133/26 , A61L29/04 , A61L31/04 , A61L27/16 , C09D151/08
Abstract: Durable, anti-fouling, crosslinked zwitterionic coatings that are grafted to the surface of a substrate through covalent bonding are disclosed. When exposed to a light source, zwitterionic monomers react with a crosslinker and with activated radicals at the surface of the substrate, simultaneously forming the crosslinked zwitterionic coating and anchoring it to the surface of the substrate. Photomasking techniques can be used to micropattern the zwitterionic coatings. The zwitterionic coatings can be applied to a variety of substrates, including medical devices and systems.
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