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公开(公告)号：US11891686B2
公开(公告)日：2024-02-06
申请号：US16485862
申请日：2018-02-13
Applicant: UNIVERSITY OF THE WEST OF SCOTLAND
Inventor： Shigeng Song , Desmond Gibson , David Hutson
CPC classification number: C23C14/35 , C03C17/3417 , C23C14/044 , C23C14/54 , C23C14/542 , C23C14/545 , C23C14/546 , G02B5/285 , H01J37/347 , H01J37/3408 , H01J37/3476 , C03C2218/156 , C03C2218/322 , C03C2218/34
Abstract: Apparatus for depositing one or more variable interference filters onto one or more substrates comprises a vacuum chamber, at least one magnetron sputtering device and at least one movable mount for supporting the one or more substrates within the vacuum chamber. The at least one magnetron sputtering device is configured to sputter material from a sputtering target towards in the mount, thereby defining a sputtering zone within the vacuum chamber. At least one static sputtering mask is located between the sputtering target and the mount. The at least one static sputtering mask is configured such that, when each substrate is moved through the sputtering zone on the at least one movable mount, a layer of material having a non-uniform thickness is deposited on each said substrate.
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公开(公告)号：US11466362B2
公开(公告)日：2022-10-11
申请号：US16607838
申请日：2018-04-25
Applicant: UNIVERSITY OF THE WEST OF SCOTLAND
Inventor： Desmond Gibson , Shigeng Song
IPC: C23C14/35 , C23C14/58 , C23C14/04 , C23C14/34 , C23C14/50 , C23C14/54 , G02B5/20 , G02B5/28 , H01J37/34
Abstract: Apparatus for depositing germanium and carbon onto one or more substrates comprises a vacuum chamber, at least first and second magnetron sputtering devices and at least one movable mount for supporting the one or more substrates within the vacuum chamber. The first magnetron sputtering device is configured to sputter germanium towards the at least one mount from a first sputtering target comprising germanium, thereby defining a germanium sputtering zone within the vacuum chamber. The second magnetron sputtering device is configured to sputter carbon towards the at least one mount from a second sputtering target comprising carbon, thereby defining a carbon sputtering zone within the vacuum chamber. The at least one mount and the at least first and second magnetron sputtering devices are arranged such that, when each substrate is moved through the germanium sputtering zone on the at least one movable mount, germanium is deposited on the said substrate, and when each substrate is moved through the carbon sputtering zone on the at least one movable mount, carbon is deposited on the said substrate.
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公开(公告)号：US11747201B2
公开(公告)日：2023-09-05
申请号：US17375897
申请日：2021-07-14
Applicant: UNIVERSITY OF THE WEST OF SCOTLAND
Inventor： Ewan Waddell , Desmond Gibson
IPC: G01J3/10 , G01J3/02 , G01J3/12 , G01J3/42 , G01N21/3504 , G01N21/3577
CPC classification number: G01J3/108 , G01J3/0208 , G01J3/12 , G01J3/42 , G01J2003/1226 , G01N21/3504 , G01N21/3577
Abstract: An optical sensor for multispectral analysis of a fluid sample comprises at least one light source, at least one interference filter, and a plurality of light detectors arranged such that light emitted by the at least one light source is incident on the at least one interference filter. There is a spatial variation in the intensity of light incident on the said at least one interference filter.
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公开(公告)号：US11092488B2
公开(公告)日：2021-08-17
申请号：US16485870
申请日：2018-02-13
Applicant: UNIVERSITY OF THE WEST OF SCOTLAND
Inventor： Ewan Waddell , Desmond Gibson
IPC: G01J3/10 , G01J3/02 , G01J3/12 , G01J3/42 , G01N21/3504 , G01N21/3577
Abstract: An optical sensor for multispectral analysis of a fluid sample comprises at least one light source, at least one interference filter, and a plurality of light detectors arranged such that light emitted by the at least one light source is incident on the at least one interference filter. There is a spatial variation in the intensity of light incident on the said at least one interference filter.
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