公开(公告)号：US20170261847A1

公开(公告)日：2017-09-14

申请号：US15310108

申请日：2015-09-24

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Daisuke YAJIMA ,  Kentaro NOMOTO ,  Yohei NAWAKI

IPC: G03F7/00

CPC classification number: G03F7/0005 ,  G02B5/3058 ,  G02B5/3075 ,  G03F7/201 ,  G03F7/203 ,  G03F7/22 ,  G03F7/70408 ,  G03F7/70475

Abstract: Disclosed herein an exposure apparatus capable of implementing a microfabrication onto a work with a higher throughput and a lower cost. The exposure apparatus generates interfering light by crossing two or more branched light beams branched from output light from a coherent light source at a predetermined interfering angle, and exposes the substrate by repeating an irradiation onto the substrate with the interfering light and a conveyance of the substrate. At this moment, the exposure apparatus shapes in interfering light irradiation region on the substrate onto which the interfering light is irradiated into a predetermined shape. Then, the exposure apparatus disposes a plurality of the interfering light irradiation regions in successive shots to be located adjacent to each other on the substrate in a direction of conveying the substrate without the interfering light irradiation regions being overlapped when exposing the substrate while conveying the substrate in a stepwise manner.

公开(公告)号：US20160153624A1

公开(公告)日：2016-06-02

申请号：US14953740

申请日：2015-11-30

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Daisuke YAJIMA ,  Kazuyuki TSURUOKA

IPC: F21K99/00 ,  F21V9/16

CPC classification number: F21V9/30 ,  F21K9/64 ,  F21Y2101/00 ,  F21Y2115/30 ,  G02B5/008 ,  G03F7/0005 ,  G03F7/201 ,  G03F7/2022 ,  G03F7/70408

Abstract: A method manufactures a light emitting element of a fluorescent light source. The method includes forming a photosensitive material layer on a fluorescent substrate, and dividing a coherent beam into branch beams. The method includes causing the branch beams to cross each other thereby generating a first interference beam, and applying an exposure process to the photosensitive material layer with the first interference beam. The method includes producing a second interference beam, and applying the exposure process to the photosensitive material with the second interference beam. The method includes removing those areas of the photosensitive material layer which are irradiated with the first and second interference beams, thereby forming a fine pattern in the photosensitive material layer. The method includes applying an etching process to the fluorescent substrate with the fine pattern of the photosensitive material layer, thereby creating a photonic structure on the fluorescent substrate.

Abstract translation: 一种制造荧光光源的发光元件的方法。 该方法包括在荧光基板上形成感光材料层，并将相干光束分成分支光束。 该方法包括使分支光束彼此交叉从而产生第一干涉光束，并且利用第一干涉光束对感光材料层施加曝光处理。 该方法包括产生第二干涉光束，以及用第二干涉光束将感光材料施加到曝光处理。 该方法包括去除用第一和第二干涉光束照射的感光材料层的那些区域，从而在感光材料层中形成精细图案。 该方法包括用感光材料层的精细图案向荧光基板施加蚀刻工艺，从而在荧光基板上产生光子结构。

公开(公告)号：US20170090289A1

公开(公告)日：2017-03-30

申请号：US15270422

申请日：2016-09-20

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Daisuke YAJIMA

IPC: G03F7/20 ,  G03F7/26 ,  G03F7/16

CPC classification number: G03F7/201 ,  G03F1/50 ,  G03F7/16 ,  G03F7/2006 ,  G03F7/2008 ,  G03F7/2022 ,  G03F7/22 ,  G03F7/26 ,  G03F7/70408 ,  G03H1/0244 ,  G03H1/0465

Abstract: A method includes dividing a single beam emitted from a coherent light source into at least two branch beams, and causing the branch beams to cross each other at a predetermined interference angle thereby generating interference light. The method also includes irradiating a target surface of a substrate with the interference light. The method also includes shaping the target surface of the substrate to a plurality of predetermined shapes, and repeating a first substep of irradiating each predetermined shape with every shot of the interference light, and a second substep of conveying the substrate in a stepwise manner such that the predetermined shapes overlap each other in the stepwise manner. The method also includes causing a line-to-line pitch of the interference fringes in one of the predetermined shapes to align with the line-to-line pitch of the interference fringes in a next predetermined shape upon repeating the first and second substeps.

公开(公告)号：US20160154309A1

公开(公告)日：2016-06-02

申请号：US14953068

申请日：2015-11-27

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Daisuke YAJIMA ,  Kazuyuki TSURUOKA

IPC: G03F7/20 ,  H01L33/20 ,  G02B5/30 ,  G03F7/40 ,  G02B1/118 ,  G02B1/12 ,  H01L33/00 ,  G03F7/36

CPC classification number: G02B5/3025 ,  G02B1/118 ,  G02B1/12 ,  G03F7/201 ,  G03F7/70408 ,  G03F7/70466

Abstract: A method manufactures a structure having a first fine pattern on a substrate. The method includes forming a resist layer on the substrate, dividing a laser beam into two branch beams, and causing the branch beams to cross each other at an interference angle thereby generating a first interference beam. The method also includes exposing the resist layer with the first interference beam. The method also includes producing a second interference beam from the branch beams such that the second interference beam crosses the first interference beam at a predetermined angle, and exposing the resist layer with the second interference beam. The method also includes removing those areas of the resist layer which are irradiated with the first and second interference beams, thereby forming a second fine pattern in the resist layer. The method also includes etching the substrate with the second fine pattern of the resist layer.

Abstract translation: 一种方法在衬底上制造具有第一精细图案的结构。 该方法包括在衬底上形成抗蚀剂层，将激光束分成两个分支光束，并使分支光束以干涉角相互交叉，从而产生第一干涉光束。 该方法还包括用第一干涉光束曝光抗蚀剂层。 该方法还包括从分支光束产生第二干涉光束，使得第二干涉光束以预定角度穿过第一干涉光束，并且用第二干涉光束曝光抗蚀剂层。 该方法还包括去除被第一和第二干涉光束照射的那些抗蚀剂层的区域，从而在抗蚀剂层中形成第二精细图案。 该方法还包括用抗蚀剂层的第二精细图案蚀刻衬底。