公开(公告)号：US20200285145A1

公开(公告)日：2020-09-10

申请号：US16650510

申请日：2018-09-28

Applicant: University of Massachusetts

Inventor： James J. Watkins ,  Irene R. Howell

IPC: G03F7/00 ,  B05D1/00 ,  C23C16/455 ,  C23C16/04 ,  C23C16/40

Abstract: Various embodiments disclosed relate to methods of manufacturing textured surfaces nanoimprint lithography with nanoparticulate inks. The present invention provides methods that allow flexible patterning of substrates with features having complex geometries.

公开(公告)号：US12099294B2

公开(公告)日：2024-09-24

申请号：US16650510

申请日：2018-09-28

Applicant: University of Massachusetts

Inventor： James J. Watkins ,  Irene R. Howell

IPC: G03F7/00 ,  B05D1/00 ,  C23C16/04 ,  C23C16/40 ,  C23C16/455

CPC classification number: G03F7/0002 ,  B05D1/005 ,  C23C16/045 ,  C23C16/405 ,  C23C16/45525

Abstract: Various embodiments disclosed relate to methods of manufacturing textured surfaces nanoimprint lithography with nanoparticulate inks. The present invention provides methods that allow flexible patterning of substrates with features having complex geometries.

公开(公告)号：US20240411224A1

公开(公告)日：2024-12-12

申请号：US18807414

申请日：2024-08-16

Applicant: University of Massachusetts

Inventor： James J. Watkins ,  Irene R. Howell

IPC: G03F7/00 ,  B05D1/00 ,  C23C16/04 ,  C23C16/40 ,  C23C16/455

Abstract: Various embodiments disclosed relate to methods of manufacturing textured surfaces nanoimprint lithography with nanoparticulate inks. The present invention provides methods that allow flexible patterning of substrates with features having complex geometries.

公开(公告)号：US12174533B2

公开(公告)日：2024-12-24

申请号：US17597746

申请日：2020-07-22

Applicant: University of Massachusetts

Inventor： James J. Watkins ,  Feyza Dundar Arisoy ,  Irene R. Howell ,  Vincent Einck

IPC: G06F7/00 ,  G03F7/00 ,  H01M4/04 ,  H01M6/40

Abstract: Various examples disclosed relate to a method of manufacturing a mechanically stabilized material that includes a nanostructure. The method includes providing a curable material disposed on a substrate. The curable material includes inorganic nanoparticles. The method further includes exposing the curable material and the substrate to pulsed electromagnetic radiation to form the mechanically stabilized material.

公开(公告)号：US20250068063A1

公开(公告)日：2025-02-27

申请号：US18942155

申请日：2024-11-08

Applicant: University of Massachusetts

Inventor： James J. Watkins ,  Feyza Dundar Arisoy ,  Irene R. Howell ,  Vincent Einck

IPC: G03F7/00 ,  H01M4/04 ,  H01M6/40

Abstract: Various examples disclosed relate to a method of manufacturing a mechanically stabilized material that includes a nanostructure. The method includes providing a curable material disposed on a substrate. The curable material includes inorganic nanoparticles. The method further includes exposing the curable material and the substrate to pulsed electromagnetic radiation to form the mechanically stabilized material.

公开(公告)号：US20220260904A1

公开(公告)日：2022-08-18

申请号：US17597746

申请日：2020-07-22

Applicant: University of Massachusetts

Inventor： James J. Watkins ,  Feyza Dundar ,  Irene R. Howell ,  Vincent Einck

IPC: G03F7/00 ,  H01M6/40 ,  H01M4/04

Abstract: Various examples disclosed relate to a method of manufacturing a mechanically stabilized material that includes a nanostructure. The method includes providing a curable material disposed on a substrate. The curable material includes inorganic nanoparticles. The method further includes exposing the curable material and the substrate to pulsed electromagnetic radiation to form the mechanically stabilized material.