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    GENERATING PLASMAS IN PULSED POWER SYSTEMS
    1.
    发明申请
    GENERATING PLASMAS IN PULSED POWER SYSTEMS 有权
    在脉冲电力系统中生成等离子体

    公开(公告)号：US20120146509A1

    公开(公告)日：2012-06-14

    申请号：US12965072

    申请日：2010-12-10

    Applicant: Uwe Hermanns

    Inventor： Uwe Hermanns

    IPC: H05B31/26

    CPC classification number: H01J37/3299 ,  H01J37/32045 ,  H01J37/32935

    Abstract: Generating plasmas in pulsed power systems. In one aspect, a system includes a plasma chamber having one or more anodes and cathodes arranged for generating a plasma in the plasma chamber, two or more plasma power supplies each having a pulsed power output suitable for generating the plasma and coupled to respective of the one or more anodes and cathodes of the plasma chamber and a signal generator supplying the input signal coupled to the inputs of the plasma power supplies. The input signal is selected to trigger the pulsing, by the arc management circuitry, of the power output from the plasma power supplies. The plasma power supplies each include arc management circuitry and an input coupled to trigger, in response to an input signal, pulsing, by the arc management circuitry, of the power output from the plasma power supply.

    Abstract translation: 在脉冲电力系统中产生等离子体。 在一个方面，系统包括具有一个或多个阳极和等离子体室的等离子体室，其布置成用于在等离子体室中产生等离子体;两个或更多个等离子体电源，每个等离子体电源具有适于产生等离子体的脉冲功率输出， 等离子体室的一个或多个阳极和阴极以及提供耦合到等离子体电源的输入的输入信号的信号发生器。 选择输入信号以通过电弧管理电路触发从等离子体电源输出的功率的脉冲。 等离子体电源各自包括电弧管理电路和耦合以响应于输入信号触发由电弧管理电路脉冲从等离子体电源的功率输出的输入。

    Generating plasmas in pulsed power systems
    3.
    发明授权
    Generating plasmas in pulsed power systems 有权
    在脉冲电力系统中产生等离子体

    公开(公告)号：US08796933B2

    公开(公告)日：2014-08-05

    申请号：US12965072

    申请日：2010-12-10

    Applicant: Uwe Hermanns

    Inventor： Uwe Hermanns

    IPC: H01J7/24

    CPC classification number: H01J37/3299 ,  H01J37/32045 ,  H01J37/32935

    Abstract: Generating plasmas in pulsed power systems. In one aspect, a system includes a plasma chamber having one or more anodes and cathodes arranged for generating a plasma in the plasma chamber, two or more plasma power supplies each having a pulsed power output suitable for generating the plasma and coupled to respective of the one or more anodes and cathodes of the plasma chamber and a signal generator supplying the input signal coupled to the inputs of the plasma power supplies. The input signal is selected to trigger the pulsing, by the arc management circuitry, of the power output from the plasma power supplies. The plasma power supplies each include arc management circuitry and an input coupled to trigger, in response to an input signal, pulsing, by the arc management circuitry, of the power output from the plasma power supply.

    Abstract translation: 在脉冲电力系统中产生等离子体。 一方面，一种系统包括具有一个或多个阳极和等离子体室的等离子体室，其布置用于在等离子体室中产生等离子体;两个或更多个等离子体电源，每个等离子体电源具有适于产生等离子体的脉冲功率输出， 等离子体室的一个或多个阳极和阴极以及提供耦合到等离子体电源的输入的输入信号的信号发生器。 选择输入信号以通过电弧管理电路触发从等离子体电源输出的功率的脉冲。 等离子体电源各自包括电弧管理电路和耦合以响应于输入信号触发由电弧管理电路脉冲从等离子体电源的功率输出的输入。

    SYSTEM AND METHODS FOR PROCESSING A SUBSTRATE
    6.
    发明申请
    SYSTEM AND METHODS FOR PROCESSING A SUBSTRATE 有权
    用于处理基板的系统和方法

    公开(公告)号：US20150079271A1

    公开(公告)日：2015-03-19

    申请号：US14364687

    申请日：2011-12-21

    Applicant: Uwe Hermanns ,  Neil Morrison ,  Tobias Stolley ,  Volker Hacker

    Inventor： Uwe Hermanns ,  Neil Morrison ,  Tobias Stolley ,  Volker Hacker

    IPC: C23C16/503 ,  C23C16/54 ,  C23C16/52

    CPC classification number: C23C16/503 ,  C23C14/54 ,  C23C14/562 ,  C23C14/564 ,  C23C16/4401 ,  C23C16/52 ,  C23C16/545

    Abstract: According to the present disclosure, a substrate processing apparatus for processing a flexible substrate including a vacuum chamber configured for being evacuated and being configured for having a process gas provided therein, a processing module adapted to process the flexible substrate, wherein the processing module is provided within the vacuum chamber, and a discharging assembly configured to generate a flow of charged particles to discharge the flexible substrate is provided. The discharging assembly is configured to generate an electric field for ionizing a processing gas.

    Abstract translation: 根据本公开，一种用于处理包括真空室的柔性基板的基板处理装置，所述真空室被构造成被抽真空并且被配置为具有设置在其中的处理气体;处理模块，其适于处理柔性基板，其中提供处理模块 并且设置有用于产生带电粒子流以排出柔性基板的排出组件。 放电组件被配置为产生用于电离处理气体的电场。

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