Dip coating process for optical elements
    1.
    发明申请
    Dip coating process for optical elements 有权
    光学元件的浸涂工艺

    公开(公告)号:US20040096577A1

    公开(公告)日:2004-05-20

    申请号:US10632415

    申请日:2003-07-31

    CPC classification number: G02B1/10 B05D1/18 G02B1/14

    Abstract: A dip coating process is disclosed that provides a coating on the surfaces of an optical element with more consistent coating thickness. The objectives of this invention are accomplished by holding the coated optical element so that a meniscus is created between the element and the surface of the coating solution. At such a position, the capillary force generated by the touching meniscus helps drain down excessive coating at the bottom of the substrate to quickly yield a consistent coating thickness over the coated surface.

    Abstract translation: 公开了一种浸涂工艺,其在光学元件的表面上提供具有更一致的涂层厚度的涂层。 通过保持涂覆的光学元件使得在元件和涂层溶液的表面之间产生弯液面来实现本发明的目的。 在这样的位置,由触摸的弯液面产生的毛细管力有助于排出基底底部的过度涂层,以在涂层表面上快速产生一致的涂层厚度。

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