公开(公告)号：US11892777B2

公开(公告)日：2024-02-06

申请号：US18046403

申请日：2022-10-13

Applicant: Waymo LLC

Inventor： Hongqin Shi ,  Yeh-Jiun Tung ,  James Dunphy ,  Cesar Gensoli

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

公开(公告)号：US20210191276A1

公开(公告)日：2021-06-24

申请号：US17166743

申请日：2021-02-03

Applicant: Waymo LLC

Inventor： Hongqin Shi ,  Yeh-Jiun Tung ,  James Dunphy ,  Cesar Gensoli

IPC: G03F7/20

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

公开(公告)号：US20230055675A1

公开(公告)日：2023-02-23

申请号：US18046403

申请日：2022-10-13

Applicant: Waymo LLC

Inventor： Hongqin Shi ,  Yeh-Jiun Tung ,  James Dunphy ,  Cesar Gensoli

IPC: G03F7/20

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

公开(公告)号：US11500295B2

公开(公告)日：2022-11-15

申请号：US17166743

申请日：2021-02-03

Applicant: Waymo LLC

Inventor： Hongqin Shi ,  Yeh-Jiun Tung ,  James Dunphy ,  Cesar Gensoli

IPC: G03F7/20

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.

公开(公告)号：US10948830B1

公开(公告)日：2021-03-16

申请号：US16724925

申请日：2019-12-23

Applicant: Waymo LLC

Inventor： Hongqin Shi ,  Yeh-Jiun Tung ,  James Dunphy ,  Cesar Gensoli

IPC: G03B27/52 ,  G03F7/20

Abstract: The present application relates to contact immersion lithography exposure units and methods of their use. An example contact exposure unit includes a container configured to contain a fluid material and a substrate disposed within the container. The substrate has a first surface and a second surface, and the substrate includes a photoresist material on at least the first surface. The contact exposure unit includes a photomask disposed within the container. The photomask is optically coupled to the photoresist material by way of a gap comprising the fluid material. The contact exposure unit also includes an inflatable balloon configured to be controllably inflated so as to apply a desired force to the second surface of the substrate to controllably adjust the gap between the photomask and the photoresist material.