Dual Layer Shielding Cover and Terminal
    1.
    发明申请
    Dual Layer Shielding Cover and Terminal 审中-公开
    双层屏蔽盖和端子

    公开(公告)号:US20170042018A1

    公开(公告)日:2017-02-09

    申请号:US15106339

    申请日:2014-06-09

    Inventor: Yunyun LONG

    Abstract: A dual layer shielding cover is provided and includes a dual layer structure with an upper layer shielding cover (22) and a lower layer shielding cover (21). The dual layer shielding cover is formed by stamping through a mould, for example, formed by bending and stretching, etc.

    Abstract translation: 提供双层屏蔽盖,并且包括具有上层屏蔽盖(22)和下层屏蔽盖(21)的双层结构。 双层屏蔽罩通过冲压通过模具形成,例如通过弯曲和拉伸等形成。

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