公开(公告)号：US20180005364A1

公开(公告)日：2018-01-04

申请号：US15200586

申请日：2016-07-01

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Ronny Soetarman ,  Hung P. Nguyen ,  James Jianguo Xu

IPC: G06T7/00 ,  G06K9/62

Abstract: A dual mode inspector includes an optical inspector configured to detect a defect located at a first location on a sample, a microscope configured to capture an image of the defect at the first location on the sample, and a platform that is configured to support the sample. The sample is not removed from the platform between the detecting of the defect located at the first location on the sample and the capturing of the image of the defect at the first location on the sample. The dual mode optical inspector also includes a controller that causes the optical inspector to detect the defect located at the first location on the sample and causes the microscope to capture the image of the defect at the first location on the sample. The dual mode inspector also performs scanning lens distortion correction to improve the capturing of defect images.

公开(公告)号：US20170261440A1

公开(公告)日：2017-09-14

申请号：US15607648

申请日：2017-05-29

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Ronny Soetarman

IPC: G01N21/958

CPC classification number: G01N21/958 ,  G01N21/47 ,  G01N21/8422 ,  G01N21/896 ,  G01N21/9505 ,  G01N21/9506 ,  G01N2021/4711 ,  G01N2021/4735 ,  G01N2021/8967

Abstract: A method and apparatus to measure specular reflection intensity, specular reflection angle, near specular scattered radiation, and large angle scattered radiation and determine the location and type of defect present in a first and a second transparent solid that have abutting surfaces. The types of defects include a top surface particle, an interface particle, a bottom surface particle, an interface bubble, a top surface pit, and a stain. The four measurements are conducted at multiple locations along the surface of the transparent solid and the measured information is stored in a memory device. The difference between an event peak and a local average of measurements for each type of measurement is used to detect changes in the measurements. Information stored in the memory device is processed to generate a work piece defect mapping indicating the type of defect and the defect location of each defect found.

公开(公告)号：US10475173B2

公开(公告)日：2019-11-12

申请号：US15200586

申请日：2016-07-01

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Ronny Soetarman ,  Hung P. Nguyen ,  James Jianguo Xu

IPC: G06K9/62 ,  G06T7/00

Abstract: A dual mode inspector includes an optical inspector configured to detect a defect located at a first location on a sample, a microscope configured to capture an image of the defect at the first location on the sample, and a platform that is configured to support the sample. The sample is not removed from the platform between the detecting of the defect located at the first location on the sample and the capturing of the image of the defect at the first location on the sample. The dual mode optical inspector also includes a controller that causes the optical inspector to detect the defect located at the first location on the sample and causes the microscope to capture the image of the defect at the first location on the sample. The dual mode inspector also performs scanning lens distortion correction to improve the capturing of defect images.

公开(公告)号：US20170336331A1

公开(公告)日：2017-11-23

申请号：US15159626

申请日：2016-05-19

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Ronny Soetarman ,  Hung P. Nguyen

IPC: G01N21/958 ,  G01N21/55 ,  G01N21/21

CPC classification number: G01N21/958 ,  G01N21/21 ,  G01N21/55 ,  G01N2201/0636 ,  G01N2201/0638 ,  G01N2201/0683 ,  G01N2201/105

Abstract: An optical inspector includes a time varying beam reflector, a radiating source that irradiates the time varying beam reflector, a telecentric scan lens configured to direct the radiation reflected by the time varying beam reflector onto a first surface of a transparent sample, a first detector that receives at least a portion of top surface specular reflection, a second detector that receives at least a portion of the bottom surface specular reflection. A turning mirror may also be included. The turning mirror is a switchable mirror that can be adjusted to a first position where the turning mirror reflects the top and bottom surface specular reflection, and can be adjusted to a second position where the turning mirror does not reflect the top or the bottom surface specular reflection. A first and second polarizing element may also be included to detect additional types of defects on either surface.

公开(公告)号：US09784691B2

公开(公告)日：2017-10-10

申请号：US14449058

申请日：2014-07-31

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Ronny Soetarman

IPC: G01N21/958 ,  G01N21/47

CPC classification number: G01N21/958 ,  G01N21/47 ,  G01N2021/4711 ,  G01N2021/4735

Abstract: A method and apparatus to measure specular reflection intensity, specular reflection angle, near specular scattered radiation, and large angle scattered radiation and determine the location and type of defect present in a first and a second transparent solid that have abutting surfaces. The types of defects include a top surface particle, an interface particle, a bottom surface particle, an interface bubble, a top surface pit, and a stain. The four measurements are conducted at multiple locations along the surface of the transparent solid and the measured information is stored in a memory device. The difference between an event peak and a local average of measurements for each type of measurement is used to detect changes in the measurements. Information stored in the memory device is processed to generate a work piece defect mapping indicating the type of defect and the defect location of each defect found.

公开(公告)号：US10094787B2

公开(公告)日：2018-10-09

申请号：US15159626

申请日：2016-05-19

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Ronny Soetarman ,  Hung P. Nguyen

IPC: G01N21/00 ,  G01N21/958 ,  G01N21/21 ,  G01N21/55

Abstract: An optical inspector includes a time varying beam reflector, a radiating source that irradiates the time varying beam reflector, a telecentric scan lens configured to direct the radiation reflected by the time varying beam reflector onto a first surface of a transparent sample, a first detector that receives at least a portion of top surface specular reflection, a second detector that receives at least a portion of the bottom surface specular reflection. A turning mirror may also be included. The turning mirror is a switchable mirror that can be adjusted to a first position where the turning mirror reflects the top and bottom surface specular reflection, and can be adjusted to a second position where the turning mirror does not reflect the top or the bottom surface specular reflection. A first and second polarizing element may also be included to detect additional types of defects on either surface.

公开(公告)号：US10769769B2

公开(公告)日：2020-09-08

申请号：US15200586

申请日：2016-07-01

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Ronny Soetarman ,  Hung P. Nguyen ,  James Jianguo Xu

IPC: G06K9/62 ,  G06T7/00

Abstract: A dual mode inspector includes an optical inspector configured to detect a defect located at a first location on a sample, a microscope configured to capture an image of the defect at the first location on the sample, and a platform that is configured to support the sample. The sample is not removed from the platform between the detecting of the defect located at the first location on the sample and the capturing of the image of the defect at the first location on the sample. The dual mode optical inspector also includes a controller that causes the optical inspector to detect the defect located at the first location on the sample and causes the microscope to capture the image of the defect at the first location on the sample. The dual mode inspector also performs scanning lens distortion correction to improve the capturing of defect images.

公开(公告)号：US20170336330A1

公开(公告)日：2017-11-23

申请号：US15159266

申请日：2016-05-19

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Ronny Soetarman ,  Hung P. Nguyen

IPC: G01N21/958 ,  G01N21/55 ,  G01N21/94

CPC classification number: G01N21/958 ,  G01L1/00 ,  G01N21/21 ,  G01N21/55 ,  G01N21/8806 ,  G01N21/94 ,  G01N2021/8854 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/105 ,  G01N2201/1247

Abstract: A method for detecting defects includes directing a scanning beam to a location on a surface of a transparent sample, measuring top and bottom surface specular reflection intensity, and storing coordinate values of the first location and the top and bottom surface specular reflection intensity in a memory. The method may further include comparing the top surface specular reflection intensity measured at each location with a first threshold value, comparing the bottom surface specular reflection intensity measured at each location with a second threshold value, and determining if a defect is present at each location and on which surface the defect is present. The method may further include comparing the top surface specular reflection intensity measured at each location with a first intensity range, comparing the bottom surface specular reflection intensity measured at each location with a second intensity range, and determining on which surface the defect is present.

公开(公告)号：US10338009B2

公开(公告)日：2019-07-02

申请号：US15607648

申请日：2017-05-29

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Ronny Soetarman

IPC: G01N21/958 ,  G01N21/47

Abstract: A method and apparatus to measure specular reflection intensity, specular reflection angle, near specular scattered radiation, and large angle scattered radiation and determine the location and type of defect present in a first and a second transparent solid that have abutting surfaces. The types of defects include a top surface particle, an interface particle, a bottom surface particle, an interface bubble, a top surface pit, and a stain. The four measurements are conducted at multiple locations along the surface of the transparent solid and the measured information is stored in a memory device. The difference between an event peak and a local average of measurements for each type of measurement is used to detect changes in the measurements. Information stored in the memory device is processed to generate a work piece defect mapping indicating the type of defect and the defect location of each defect found.

公开(公告)号：US09921169B2

公开(公告)日：2018-03-20

申请号：US15159266

申请日：2016-05-19

Applicant: Zeta Instruments, Inc.

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Ronny Soetarman ,  Hung P. Nguyen

IPC: G01N21/55 ,  G01N21/958 ,  G01N21/94

CPC classification number: G01N21/958 ,  G01L1/00 ,  G01N21/21 ,  G01N21/55 ,  G01N21/8806 ,  G01N21/94 ,  G01N2021/8854 ,  G01N2201/06113 ,  G01N2201/0683 ,  G01N2201/105 ,  G01N2201/1247

Abstract: A method for detecting defects includes directing a scanning beam to a location on a surface of a transparent sample, measuring top and bottom surface specular reflection intensity, and storing coordinate values of the first location and the top and bottom surface specular reflection intensity in a memory. The method may further include comparing the top surface specular reflection intensity measured at each location with a first threshold value, comparing the bottom surface specular reflection intensity measured at each location with a second threshold value, and determining if a defect is present at each location and on which surface the defect is present. The method may further include comparing the top surface specular reflection intensity measured at each location with a first intensity range, comparing the bottom surface specular reflection intensity measured at each location with a second intensity range, and determining on which surface the defect is present.