公开(公告)号：US09896604B2

公开(公告)日：2018-02-20

申请号：US14206947

申请日：2014-03-12

Applicant: Ecolab USA Inc.

Inventor： Kim Marie Long ,  Michael A. Kamrath ,  Sean McCue

IPC: H01L21/302 ,  H01L21/461 ,  H01L21/311 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C09G1/02 ,  H01L21/3105 ,  H01L21/02 ,  H01L21/768 ,  C09G1/04 ,  B24B37/04 ,  B24B7/22 ,  B81C1/00

CPC classification number: C09G1/02 ,  B24B7/228 ,  B24B37/044 ,  B81C1/00611 ,  B81C2201/0118 ,  C09G1/04 ,  H01L21/02065 ,  H01L21/31051 ,  H01L21/31055 ,  H01L21/7684

Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.

公开(公告)号：US20170140921A1

公开(公告)日：2017-05-18

申请号：US15336909

申请日：2016-10-28

Applicant: CANON KABUSHIKI KAISHA

Inventor： Niyaz Khusnatdinov ,  Dwayne L. LaBrake

IPC: H01L21/027 ,  H01L21/306 ,  H01L21/308

CPC classification number: H01L21/0273 ,  B81C1/00611 ,  B81C2201/0118 ,  B81C2201/0121 ,  B81C2201/0126 ,  H01L21/28194 ,  H01L21/30604 ,  H01L21/30655 ,  H01L21/3081 ,  H01L21/3085 ,  H01L21/3086 ,  H01L21/31116 ,  H01L21/31138 ,  H01L21/7684

Abstract: Methods of reversing the tone of a pattern having non-uniformly sized features. The methods include depositing a highly conformal hard mask layer over the patterned layer with a non-planar protective coating and etch schemes for minimizing critical dimension variations.

公开(公告)号：US20230331546A1

公开(公告)日：2023-10-19

申请号：US17724157

申请日：2022-04-19

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor： FAN HU ,  WEN-CHUAN TAI ,  LI-CHUN PENG ,  HSIANG-FU CHEN

IPC: B81C3/00

CPC classification number: B81C3/001 ,  B81C2201/0118 ,  B81C2203/0109 ,  B81C2203/0172

Abstract: A MEMS package is provided. The MEMS package includes a metallization layer, a planarization structure, a MEMS device structure, a cap structure and a pressure adjustment element. The planarization structure has an inner sidewall defining a first cavity exposing the metallization layer. The MEMS device structure is bonded to the planarization structure. The MEMS device structure includes a movable element over the first cavity. The cap structure is bonded to the MEMS device structure and has an inner sidewall defining a second cavity facing the movable element. The pressure adjustment element is disposed in the second cavity.

公开(公告)号：US20140263170A1

公开(公告)日：2014-09-18

申请号：US14206947

申请日：2014-03-12

Applicant: Ecolab USA Inc.

Inventor： Kim Marie Long ,  Michael A. Kamrath ,  Sean McCue

IPC: C09G1/02

CPC classification number: C09G1/02 ,  B24B7/228 ,  B24B37/044 ,  B81C1/00611 ,  B81C2201/0118 ,  C09G1/04 ,  H01L21/02065 ,  H01L21/31051 ,  H01L21/31055 ,  H01L21/7684

Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.

Abstract translation: 本文描述了使用在酸性水溶液中具有胶体硅铝酸盐颗粒的组合物来抛光蓝宝石表面的组合物，试剂盒和方法。 在一些方面，抛光蓝宝石表面的方法可包括用旋转抛光垫和抛光组合物研磨蓝宝石表面。 抛光组合物可以包括一定量的胶体硅铝酸盐，并且可以具有约2.0至约7.0的pH。