Abstract:
A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.
Abstract:
Systems, methods and other embodiments associated with spatial-domain Low-coherence Quantitative Phase Microscopy (SL-QPM) are described herein. SL-QPM can detect structural alterations within cell nuclei with nanoscale sensitivity (0.9 nm) (or nuclear nano-morphology) for “nano-pathological diagnosis” of cancer. SL-QPM uses original, unmodified cytology and histology specimens prepared with standard clinical protocols and stains. SL-QPM can easily integrate in existing clinical pathology laboratories. Results quantified the spatial distribution of optical path length or refractive index in individual nuclei with nanoscale sensitivity, which could be applied to studying nuclear nano-morphology as cancer progresses. The nuclear nano-morphology derived from SL-QPM offers significant diagnostic value in clinical care and subcellular mechanistic insights for basic and translational research. Techniques that provide for depth selective investigation of nuclear and other cellular features are disclosed.
Abstract:
Apparatus and methods for in situ and ex situ measurements of spatial profiles of the modulus of the complex amplitude and intensity of flare generated by an optical system. The in situ and ex situ measurements comprise interferometric and non-interferometric measurements that use an array of diffraction sites simultaneously located in an object plane of the optical system to increase signals related to measured properties of flare in a conjugate image plane. The diffraction sites generate diffracted beams with randomized relative phases. In general, the interferometric profile measurements employ phase-shifting point-diffraction interferometry to generate a topographical interference signal and the non-interferometric measurements are based on flare related signals other than topographic interference signals. The topographical interference signal and flare related signals are generated by a detector either as an electrical interference signal or electrical flare related signals or as corresponding exposure induced changes in a recording medium.
Abstract:
Apparatus and method for measuring an optical imaging system, and detector unit. The measuring apparatus contains an arrangement for combining wavefront and distortion measurements. For this purpose, respectively associated interferometry and Moiré structures can be introduced on the object side and image side. The detector unit contains a fiber plate and/or a flexible image conductor with a curved entry surface or with at least two different entry surfaces, which are offset axially or inclined spatially with respect to each other, or with an axially movable entry surface. By way of suitable wavefront acquisition in various lateral positions of object and/or image structure, a topographic calibration of the object or image structure can be carried out. Furthermore, by way of a Moiré technique, the lateral displacement travel in phase-shifting steps for the wavefront acquisition and, by way of point diffraction interferometry, the axial relative position of object and image structure can be determined highly accurately. The apparatus and method are used, in particular, for measuring lenses in microlithography installations.
Abstract:
An apparatus in one example has: first and second Fourier transform lenses, the first Fourier transform lens receiving an incident plane wavefront and focusing the plane wavefront down to a focal point in a focal plane, and the second Fourier transform lens reimaging the focused down plane wavefront to an output plane wavefront; a bead located substantially at the focal point and that is illuminated by radiation that comes in from the first lens, the bead reradiating a spherical wave, which interferes with light that passes around the bead to produce a diffraction pattern; an array of controllable light transmissive elements that support the bead in the focal plane; and a null seeking servomechanism for assigning an electrical value of phase departure of the incident plane wavefront from a reference thereof, the null seeking servomechanism controlling the light transmissive elements to produce phase shifts in light that passes around the bead to thereby remove aberrations in the incident plane wavefront.
Abstract:
The present invention relates to vibration-insensitive point-diffraction interferometry. For the purpose of obtaining high immunity to vibration, a single-mode optical fiber is used to generate the reference wave, by means of point diffraction, directly from a measurement wave reflected from test objects. The capability of vibration desensitization is further strengthened by adding a spatial phase-shift device that enables four interferograms of different amounts of phase shift to be obtained simultaneously with no time delay between interferograms. The present invention may be effectively used in the design of measuring systems for in-line applications where measurements need to be performed in the presence of significant levels of vibration.
Abstract:
A common-path, point-diffraction, phase-shifting interferometer uses a half wave plate having a diffractive element, such as pin hole. A coherent, polarized light source simultaneously generates a reference beam from the diffractive element and an object beam from remaining portions of the light going through the half wave plate. The reference beam has a nearly spherical wavefront. Each of the two beams possesses a different polarization state. The object and reference beams are then independently phase modulated by a polarization sensitive phase modulator that shifts phase an amount depending on applied voltage and depending on polarization state of the incident light. A polarizer is then used to provide the object and reference beams in the same polarization state with equal intensities so they can interfere to create an interferogram with near unity contrast.
Abstract:
A point diffraction interferometer for measuring properties of a spatial impulse response function, the interferometer including: a source for generating a source beam; an optical system; an optical element including a test object located in an object plane of the optical system, the test object including a diffraction point for generating from the source beam a measurement beam that passes through the optical system, wherein the optical element also generates from the source beam a reference beam that is combined with the measurement beam to generate an interference pattern in an image plane of the optical system, the interference pattern representing the spatial impulse response function of the optical system.
Abstract:
An apparatus for effecting spatial Fourier transform spectroscopic detection of light from a surface luminescent object with high sensitivity by use of a quadrangular common path interferometer. The apparatus includes an improvement which consists of an additional imaging optical system which converges a light beam from the specimen so as to enter the beam splitter. The additional imaging optical system is disposed so that an image position is substantially coincident with the position of the second of three mirrors in the apparatus.
Abstract:
According to a first aspect, there is provided a method of holographic wavefront sensing, the method including: receiving a light beam, which has a wavefront to be analyzed, on a transparent, flat substrate, which is provided with a lattice of opaque dots, wherein the substrate is arranged above an image sensor; detecting by the image sensor an interference pattern formed by diffracted light, being scattered by the opaque dots, and undiffracted light of the light beam received by the image sensor; processing the detected interference pattern to digitally reconstruct a representation of a displaced lattice of opaque dots, which would form the interference pattern on the image sensor upon receiving the light with a known wavefront; and comparing the representation of the displaced lattice to a known representation of the lattice of opaque dots on the substrate to determine a representation of the wavefront form of the received light beam.