公开(公告)号：US06433877B1

公开(公告)日：2002-08-13

申请号：US09819245

申请日：2001-03-28

Applicant: Masao Watanabe ,  Akiko Okubo

Inventor： Masao Watanabe ,  Akiko Okubo

IPC: G01J404

Abstract: A surface inspection device irradiates a laser beam onto the surface of a sample, scans the surface two-dimensionally, and detects the intensities of the s-polarized light component and p-polarized light component of the reflected laser beam. RR (reflectance ratio), which is the ratio of the reflective intensities of the s- and p-polarized light components, is calculated for each position of the surface of the sample, and the two-dimensional distribution of RR on the surface of the sample is detected. The distribution width of this measured RR is compared with the natural width for a clean sample, and the surface of the sample is determined to be contaminated when, as the result of comparison, the RR distribution width diverges from the natural width. The absence or presence of contamination on the microscopically rough surface of a sample can therefore be quickly and easily determined based on the RR of the reflective intensities of the s- and p-polarized light components.

公开(公告)号：US06268914B1

公开(公告)日：2001-07-31

申请号：US09483708

申请日：2000-01-14

Applicant: Baoliang Wang

Inventor： Baoliang Wang

IPC: G01J404

CPC classification number: G01N21/23 ,  G01N21/274

Abstract: A dynamic self calibration process periodically calibrates a system for precisely measuring low-level birefringence properties (retardance and fast axis orientation) of optical materials. Variations in birefringence measurements can be caused by, for example, changes in the environmental conditions ( e.g., ambient pressure or temperature) under which birefringence properties of a sample are measured. In one implementation, the dynamic self calibration process repeatedly calibrates the system at different selected frequencies to compensate for different selected baseline variations.

Abstract translation: 动态自校准过程周期性地校准用于精确测量光学材料的低级双折射性质（延迟和快轴取向）的系统。 双折射测量的变化可以由例如测量样品的双折射性质的环境条件（例如环境压力或温度）的变化引起。 在一个实施方式中，动态自校准过程在不同的选定频率下重复地校准系统以补偿不同的所选基线变化。

公开(公告)号：US06384916B1

公开(公告)日：2002-05-07

申请号：US09715921

申请日：2000-11-17

Applicant: Thomas E. Furtak

Inventor： Thomas E. Furtak

IPC: G01J404

CPC classification number: G01J4/04 ,  G01J3/447 ,  G01J4/00 ,  G01N21/211

Abstract: The parallel detecting spectroscopic ellipsometer/polarimeter sensor has no moving parts and operates in real-time for in-situ monitoring of the thin film surface properties of a sample within a processing chamber. It includes a multi-spectral source of radiation for producing a collimated beam of radiation directed towards the surface of the sample through a polarizer. The thus polarized collimated beam of radiation impacts and is reflected from the surface of the sample, thereby changing its polarization state due to the intrinsic material properties of the sample. The light reflected from the sample is separated into four separate polarized filtered beams, each having individual spectral intensities. Data about said four individual spectral intensities is collected within the processing chamber, and is transmitted into one or more spectrometers. The data of all four individual spectral intensities is then analyzed using transformation algorithms, in real-time.

Abstract translation: 平行检测光谱椭偏仪/偏振计传感器没有移动部件，可以实时地进行处理室内样品的薄膜表面性质的现场监测。 它包括用于产生通过偏振器指向样品表面的准直辐射束的多光谱辐射源。 这样偏振的准直辐射光束会从样品表面反射并反射，从而由于样品的固有材料特性而改变其偏振状态。 从样品反射的光被分离成四个分离的偏振滤光束，每个具有单独的光谱强度。 关于所述四个单个光谱强度的数​​据被收集在处理室内，并被传送到一个或多个光谱仪中。 然后使用变换算法实时分析所有四个单独光谱强度的数​​据。

公开(公告)号：US06307627B1

公开(公告)日：2001-10-23

申请号：US09441253

申请日：1999-11-16

Applicant: Gerard H. Vurens

Inventor： Gerard H. Vurens

IPC: G01J404

CPC classification number: G01J4/04 ,  G01N21/211

Abstract: An optical measurement system for evaluating the surface of a substrate or the thickness and optical characteristics of a thin film layer overlying the substrate includes a light source for generating a light beam, a static polarizing element for polarizing the light beam emanating from the light source, and a measurement system for measuring the light reflected from the substrate location. The measurement system includes a static beam splitting element for splitting the light reflected from the substrate into s-polarized light and p-polarized light. The measurement system further includes two optical sensors for separately measuring the amplitude of the s-polarized light and the intensity of the p-polarized light. A control system analyzes the measured amplitude of the s-polarized light and the p-polarized to determine changes in the topography of substrate or changes in the thickness or optical characteristics of the thin film layer.

Abstract translation: 用于评价基板的表面的光学测量系统或覆盖基板的薄膜层的厚度和光学特性包括用于产生光束的光源，用于使从光源发出的光束偏振的静态偏振元件， 以及用于测量从基板位置反射的光的测量系统。 测量系统包括用于将从衬底反射的光分解成s偏振光和p偏振光的静态分束元件。 该测量系统还包括用于分别测量s偏振光的振幅和p偏振光的强度的两个光学传感器。 控制系统分析s偏振光和p偏振的测量幅度，以确定衬底的形貌变化或薄膜层的厚度或光学特性的变化。

公开(公告)号：US06583877B2

公开(公告)日：2003-06-24

申请号：US10150590

申请日：2002-05-17

Applicant: Adam E. Norton

Inventor： Adam E. Norton

IPC: G01J404

CPC classification number: G02B17/0884 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/42 ,  G01N21/211 ,  G01N21/47 ,  G02B17/08 ,  G02B17/0852

Abstract: Achromatic optics may be employed in spectroscopic measurement systems. The achromatic optics comprises a spherical mirror receiving a beam of radiation in a direction away from its axis and a pair of lenses: a positive lens and a negative meniscus lens. The negative meniscus lens corrects for the spherical aberration caused by off-axis reflection from the spherical mirror. The positive lens compensates for the achromatic aberration introduced by the negative lens so that the optics, as a whole, is achromatic over visible and ultraviolet wavelengths. Preferably, the two lenses combined have zero power or close to zero power. By employing a spherical mirror, it is unnecessary to employ ellipsoidal or paraboloidal mirrors with artifacts of diamond turning which limit the size of the spot of the sample that can be measured in ellipsometry, reflectometry or scatterometry.

公开(公告)号：US06515745B2

公开(公告)日：2003-02-04

申请号：US10036062

申请日：2001-10-19

Applicant: Gerard H. Vurens ,  David L. Klein

Inventor： Gerard H. Vurens ,  David L. Klein

IPC: G01J404

CPC classification number: G01J4/04 ,  G01N21/211

Abstract: An optical measurement system for evaluating the surface of a substrate or the thickness and optical characteristics of a thin film layer overlying the substrate includes a light source for generating a light beam, a static polarizing element for polarizing the light beam emanating from the light source, and a measurement system for measuring the light reflected from the substrate location. The measurement system includes a static beam splitting element for splitting the light reflected from the substrate into s-polarized light and p-polarized light. The measurement system further includes two optical sensors for separately measuring the amplitude of the s-polarized light and the intensity of the p-polarized light. A control system analyzes the measured amplitude of the s-polarized light and the p-polarized to determine changes in the topography of substrate or changes in the thickness or optical characteristics of the thin film layer.

Abstract translation: 用于评价基板的表面的光学测量系统或覆盖基板的薄膜层的厚度和光学特性包括用于产生光束的光源，用于使从光源发出的光束偏振的静态偏振元件， 以及用于测量从基板位置反射的光的测量系统。 测量系统包括用于将从衬底反射的光分解成s偏振光和p偏振光的静态分束元件。 该测量系统还包括用于分别测量s偏振光的振幅和p偏振光的强度的两个光学传感器。 控制系统分析s偏振光和p偏振的测量幅度，以确定衬底的形貌变化或薄膜层的厚度或光学特性的变化。

公开(公告)号：US06788410B1

公开(公告)日：2004-09-07

申请号：US09460864

申请日：1999-12-14

Applicant: Akihito Otani ,  Toshinobu Otsubo

Inventor： Akihito Otani ,  Toshinobu Otsubo

IPC: G01J404

CPC classification number: G01M11/331 ,  G01J7/00 ,  G01M11/332 ,  G01M11/335 ,  G01M11/336

Abstract: A delay time measurement apparatus for an optical element includes a pulse light source, wavelength setting unit, optical power divider, optical delay unit, controller, and detector. The pulse light source can vary the wavelength of light to be output, and outputs an optical pulse having a predetermined repetition period. The wavelength setting unit sets the wavelength of light to be output from the pulse light source. The optical power divider divides the optical pulse output from the pulse light source into a first optical pulse and a second optical pulse to be input to an optical element as the object to be measured. The optical delay unit can vary the spatial optical path length along which the first optical pulse divided by the optical power divider travels. The controller changes the spatial optical path length of the optical delay unit. The detector receives a measurement optical pulse output from the optical element as the object to be measured, and a reference optical pulse output from the optical delay unit, and detects the delay time of light that has passed through the optical element as the object to be measured from a change in spatial optical path length required for superposing the measurement and reference optical pulses on each other.

Abstract translation: 用于光学元件的延迟时间测量装置包括脉冲光源，波长设置单元，光功率分配器，光学延迟单元，控制器和检测器。 脉冲光源可以改变要输出的光的波长，并输出具有预定重复周期的光脉冲。 波长设定单元设定从脉冲光源输出的光的波长。 光功率分配器将来自脉冲光源的光脉冲输出分成第一光脉冲和第二光脉冲，以输入到作为待测对象的光学元件。 光学延迟单元可以改变由光功率分配器划分的第一光脉冲行进的空间光程长度。 控制器改变光学延迟单元的空间光程长度。 检测器接收从作为被测量对象的光学元件输出的测量光脉冲和从光学延迟单元输出的基准光脉冲，并且检测作为对象物体的已经通过光学元件的光的延迟时间 从将测量和参考光脉冲叠加在一起所需的空间光程长度的变化来测量。

公开(公告)号：US06717671B1

公开(公告)日：2004-04-06

申请号：US09347622

申请日：1999-07-02

Applicant: Steven W. Meeks ,  Rusmin Kudinar

Inventor： Steven W. Meeks ,  Rusmin Kudinar

IPC: G01J404

CPC classification number: G01B11/065 ,  G01B11/303

Abstract: A system and method for performing a magnetic imaging, optical profiling, and measuring lubricant thickness and degradation, carbon wear, carbon thickness, and surface roughness of thin film magnetic disks at angles that are not substantially Brewster's angle of the thin film protective overcoat.

Abstract translation: 用于以基本上薄膜保护性外涂层的布鲁斯特角的角度进行磁性成像，光学轮廓和测量润滑剂厚度和降解，碳磨损，碳厚度和薄膜磁盘的表面粗糙度的系统和方法。