Abstract:
A process for glass passivating silicon semiconductor junctions comprises the steps of coating a slice of semiconductor material containing exposed rectifying junctions in a liquid mixture of powdered glass and an organic component, spinning the slice to remove excess mixture, but leave remaining on the slice a thin uniform film of the mixture, heating the slice in an oxygen atmosphere to form a very thin silicon dioxide layer on the surface of the slice while burning off the organic component to leave the glass in a highly compacted, dry powder form tightly adhering to the slice, and again heating the slice in a dry, substantially oxygen-free atmosphere at a temperature sufficient to fuse the glass powder together and to the slice.
Abstract:
A first insulating film of silicon dioxide is provided on the surface of a semiconductor device, and a second silicon dioxide layer containing uniformly a small amount of phosphorus is deposited from the vapor phase on said first insulating film, thereby realizing stable passivation of the electrical characteristics of said semiconductor device. The waterproof property and accurate etching of said films are also accomplished.
Abstract:
Method of hermetically sealing hard glass to metal as in the encapsulation of a semiconductor device wherein the glass and metal are assembled in loosely fitting relationship and placed in an oven. The assembly is then heated under nonoxidizing conditions at a first pressure. The nonoxidizing atmosphere is then evacuated to produce a second pressure and an oxygen containing gas is then introduced to produce a third pressure and to oxidize the metal when the temperature is increased to the range at which the metal oxidizes. The oxygen-containing atmosphere is then flushed out by introducing a nonoxidizing gas under pressure. The temperature is increased till the glass softens and seals with the metal. The sealed structure is then cooled.
Abstract:
METHOD OF PREVENTING TEMPERATURE-VOLTAGE DEGRADATION OF P-N JUNCTIONDIODES BY PACKAGING THE DIODE WITH A COMPOUND WHICH YIELDS PHOSPHOROUS PENTOXIDE UPON BEING HEATED.
Abstract:
A PLURALITY OF SEMICONDUCTOR DEVICES ARE ENCAPSULATED SIMULTANEOUSLY IN A THERMOSETTING PLASTIC BY A PROCESS THAT INCLUDES THE USE OF TRANSFER MOLDING TECHNIQUES. DISCRETE SEMICONDUCTOR DEVICES, SUCH AS TRANSISTORS, ARE STRIP MOLDED AS A UNIT AND SEPARATED AFTER THE THERMOSETTING PLASTIC HAS CURED. PRIOR TO THE MOLDING PROCESS, AN ARRAY OF LEAD WIRES INTERCONNECTED BY PARTIALLY SHEARED TIE-BARS ARE STAKED TO INDIVIDUAL HEAT SINKS ALSO FORMED IN A STRIP. A SEMICONDUCTOR DEVICE IS MOUNTED TO EACH OF THE INDIVIDUAL HEAT SINKS AND WHISKER LEAD WIRES ARE BONDED TO THE ACTIVE REGIONS OF THE DEVICE AND THE LEAD WIRES. TO PREVENT CONTAMINATION OF THE SEMICONDUCTOR JUNCTIONS WITH ATMOSPHERIC IMPURITIES, THE WAFERS ARE COATED WITH A PROTECTIVE MATERIAL. GROOVES ARE COINED INTO THE HEAT SINK TO LIMIT THE WAFER COATING MATERIAL TO A RESTRICTED AREA. AFTER THE STRIP MOLDING STEP HAS BEEN COMPLETED, THE INDIVIDUAL SEMICONDUCTOR DEVICES ARE SEPARATED BY CUTTING THE TIE-BARS AND SAWING THE INDIVIDUAL HEAT SINKS.
Abstract:
A method of assembly of a transistor, wherein a lead support member and pairs of collector lead molds are punched in advance in a tape-shaped metal sheet; a lead support member corresponding to said lead support member and pairs of emitter-base lead molds are punched in another tape-shaped metal sheet; a collector electrode of a planar type transistor is put into contact with the center of said collector lead; the position of the end parts of the base and emitter leads with respect to the position of said collector lead is defined by piling up said two support members and thereby the end parts of said two leads are put into contact with said base and emitter electrodes of the transistor; all of said leads and electrodes corresponding thereto are coupled mutually by soldering; said transistor part is molded with resin; and said leads are removed from said respective support members.