Invention Grant
- Patent Title: Multi charged particle beam exposure method, and multi charged particle beam exposure apparatus
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Application No.: US15605343Application Date: 2017-05-25
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Publication No.: US10269532B2Publication Date: 2019-04-23
- Inventor: Hiroshi Matsumoto
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama-shi
- Assignee: NuFlare Technology, Inc
- Current Assignee: NuFlare Technology, Inc
- Current Assignee Address: JP Yokohama-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-111997 20160603
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/30 ; H01J37/04 ; H01J37/10 ; H01J37/302 ; H01J37/317

Abstract:
A multi charged particle beams exposure method includes assigning, with respect to plural times of shots of multi-beams using a charged particle beam, each shot to one of plural groups, depending on a total current value of beams becoming in an ON condition in a shot concerned in the multi-beams, changing the order of the plural times of shots so that shots assigned to the same group may be continuously emitted for each of the plural groups, correcting, for each group, a focus position of the multi-beams to a focus correction position for a group concerned corresponding to the total current value, and performing the plural times of shots of the multi-beams such that the shots assigned to the same group are continuously emitted in a state where the focus position of the multi-beams has been corrected to the focus correction position for the group concerned.
Public/Granted literature
- US20170352520A1 MULTI CHARGED PARTICLE BEAM EXPOSURE METHOD, AND MULTI CHARGED PARTICLE BEAM EXPOSURE APPARATUS Public/Granted day:2017-12-07
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