Invention Grant
- Patent Title: Method for manufacturing secondary cell
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Application No.: US15737731Application Date: 2016-05-17
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Publication No.: US10367140B2Publication Date: 2019-07-30
- Inventor: Tomokazu Saito , Harutada Dewa
- Applicant: KABUSHIKI KAISHA NIHON MICRONICS
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Nihon Micronics
- Current Assignee: Kabushiki Kaisha Nihon Micronics
- Current Assignee Address: JP Tokyo
- Agency: McCoy Russell LLP
- Priority: JP2015-127653 20150625
- International Application: PCT/JP2016/002410 WO 20160517
- International Announcement: WO2016/208116 WO 20161229
- Main IPC: H01L49/00
- IPC: H01L49/00 ; B05D3/06 ; B05D1/36 ; B05D3/02 ; H01M14/00 ; H01M4/04 ; H01L29/06

Abstract:
A method for manufacturing a secondary cell, the secondary cell including a charging layer that captures electrons by forming energy levels in a band gap by causing a photoexcited structural change in an n-type metal oxide semiconductor coated with an insulating material, includes a coating step to coat a coating liquid so as to form a coating film that includes constituents that will form the charging layer; a drying step to dry the coating liquid coated in the coating step; a UV irradiating step to form a UV-irradiated coating film by irradiating the dried coating film obtained through the drying step with ultraviolet light; and a burning step to burn a plurality of the UV-irradiated coating films, after forming the plurality of UV-irradiated coating films by repeating a set plural times, the set including the coating step, the drying step, and the UV irradiating step.
Public/Granted literature
- US20180182959A1 METHOD FOR MANUFACTURING SECONDARY CELL Public/Granted day:2018-06-28
Information query
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