Invention Grant
- Patent Title: Manufacturing method of light-emitting device
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Application No.: US16159251Application Date: 2018-10-12
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Publication No.: US10593829B2Publication Date: 2020-03-17
- Inventor: Po-Shun Chiu , De-Shan Kuo , Jhih-Jheng Yang , Jiun-Ru Huang , Jian-Huei Li , Ying-Chieh Chen , Zi-Jin Lin
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/22 ; H01L33/10

Abstract:
A method of manufacturing a light-emitting device is disclosed. The method includes providing a light-emitting diode wafer, including a substrate and a semiconductor stack on the substrate, wherein the semiconductor stack has a lower surface facing the substrate and an upper surface opposite to the lower surface; providing a first laser on the light-emitting diode wafer and irradiating the light-emitting diode wafer from the upper surface to form a plurality of scribing lines on the upper surface; providing an etching process; providing and focusing a second laser on an interior of the substrate to form one or a plurality of textured areas in the substrate; and providing force on the light-emitting diode wafer to separate the light-emitting diode wafer into a plurality of light-emitting diode chips along the plurality of scribing lines.
Public/Granted literature
- US20190051791A1 MANUFACTURING METHOD OF LIGHT-EMITTING DEVICE Public/Granted day:2019-02-14
Information query
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