Invention Grant
- Patent Title: Beam irradiation device
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Application No.: US16291090Application Date: 2019-03-04
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Publication No.: US10832886B2Publication Date: 2020-11-10
- Inventor: Akira Ikegami , Yuta Kawamoto , Naomasa Suzuki , Manabu Yano , Yasushi Ebizuka , Naoma Ban
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3f2e5226
- Main IPC: H01J37/141
- IPC: H01J37/141 ; H01J37/153 ; H01J37/28 ; H01J37/147 ; H01J37/09

Abstract:
The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
Public/Granted literature
- US20190287754A1 Beam Irradiation Device Public/Granted day:2019-09-19
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