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公开(公告)号:US11239042B2
公开(公告)日:2022-02-01
申请号:US17060242
申请日:2020-10-01
Applicant: Hitachi High-Tech Corporation
Inventor: Akira Ikegami , Yuta Kawamoto , Naomasa Suzuki , Manabu Yano , Yasushi Ebizuka , Naoma Ban
IPC: H01J37/141 , H01J37/153 , H01J37/28 , H01J37/147 , H01J37/09
Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
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公开(公告)号:US10832886B2
公开(公告)日:2020-11-10
申请号:US16291090
申请日:2019-03-04
Applicant: Hitachi High-Tech Corporation
Inventor: Akira Ikegami , Yuta Kawamoto , Naomasa Suzuki , Manabu Yano , Yasushi Ebizuka , Naoma Ban
IPC: H01J37/141 , H01J37/153 , H01J37/28 , H01J37/147 , H01J37/09
Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.
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