Invention Grant
- Patent Title: Dose-based end-pointing for low-kV FIB milling in TEM sample preparation
-
Application No.: US16566647Application Date: 2019-09-10
-
Publication No.: US11313042B2Publication Date: 2022-04-26
- Inventor: Thomas G. Miller , Jason Arjavac , Michael Moriarty
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Main IPC: H01J37/00
- IPC: H01J37/00 ; C23F1/04 ; H01J37/302 ; G01N1/32 ; H01J37/305 ; H01J37/304

Abstract:
A method, system, and computer-readable medium for forming transmission electron microscopy sample lamellae using a focused ion beam including directing a high energy focused ion beam toward a bulk volume of material; milling away the unwanted volume of material to produce an unfinished sample lamella with one or more exposed faces having a damage layer; characterizing the removal rate of the focused ion beam; subsequent to characterizing the removal rate, directing a low energy focused ion beam toward the unfinished sample lamella for a predetermined milling time to deliver a specified dose of ions per area from the low energy focused ion beam; and milling the unfinished sample lamella with the low energy focused ion beam to remove at least a portion of the damage layer to produce the finished sample lamella including at least a portion of the feature of interest.
Public/Granted literature
- US20200095688A1 DOSE-BASED END-POINTING FOR LOW-KV FIB MILLING IN TEM SAMPLE PREPARATION Public/Granted day:2020-03-26
Information query