Invention Grant
- Patent Title: Laser gas regenerating apparatus and electronic device manufacturing method
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Application No.: US17009160Application Date: 2020-09-01
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Publication No.: US11451003B2Publication Date: 2022-09-20
- Inventor: Hiroaki Tsushima , Satoshi Tanaka , Yousuke Fujimaki , Takeshi Asayama , Osamu Wakabayashi
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: Studebaker & Brackett PC
- Priority: JPPCT/JP2018/016600 20180424
- Main IPC: H01S3/036
- IPC: H01S3/036 ; G03F7/20 ; H01S3/225

Abstract:
A laser gas regenerating apparatus regenerates a discharged gas discharged from at least one ArF excimer laser apparatus and supplies the regenerated gas to the at least one ArF excimer laser apparatus connected to a first laser gas supply source that supplies a first laser gas and to a second laser gas supply source that supplies a second laser gas. The laser gas regenerating apparatus includes a data obtaining unit that obtains data on a supply amount of the second laser gas supplied to the at least one ArF excimer laser apparatus; a xenon adding unit that adds, to the regenerated gas, a third laser gas; and a control unit that controls, based on the supply amount, an addition amount of the third laser gas by the xenon adding unit.
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