- Patent Title: Electron microscope and sample observation method using the same
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Application No.: US17263017Application Date: 2019-07-26
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Publication No.: US11551907B2Publication Date: 2023-01-10
- Inventor: Ken Harada , Keiko Shimada , Shigeo Mori , Atsuhiro Kotani
- Applicant: RIKEN , UNIVERSITY PUBLIC CORPORATION OSAKA
- Applicant Address: JP Wako; JP Osaka
- Assignee: RIKEN,UNIVERSITY PUBLIC CORPORATION OSAKA
- Current Assignee: RIKEN,UNIVERSITY PUBLIC CORPORATION OSAKA
- Current Assignee Address: JP Wako; JP Osaka
- Agency: Miles & Stockbridge, P.C.
- Priority: JPJP2018-140161 20180726
- International Application: PCT/JP2019/029360 WO 20190726
- International Announcement: WO2020/022469 WO 20200130
- Main IPC: H01J37/26
- IPC: H01J37/26 ; G01N23/201 ; H01J37/09 ; H01J37/10 ; H01J37/147 ; H01J37/20 ; H01J37/22

Abstract:
An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample, and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded, and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.
Public/Granted literature
- US20210233741A1 ELECTRON MICROSCOPE AND SAMPLE OBSERVATION METHOD USING THE SAME Public/Granted day:2021-07-29
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