- Patent Title: Concurrent laser cleaning and spectroscopic cleanliness monitoring
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Application No.: US17833670Application Date: 2022-06-06
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Publication No.: US12158372B2Publication Date: 2024-12-03
- Inventor: Joseph Christian , Jorge Filevich
- Applicant: FEI Company
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Klarquist Sparkman, LLP
- Main IPC: G01J3/44
- IPC: G01J3/44 ; G01J3/02 ; G01N21/65 ; G01N21/94 ; H01J37/28

Abstract:
Methods and apparatus are disclosed for concurrent cleaning and cleanliness monitoring of a sample such as a substrate for electron point projection microscopy. A graphene sample is illuminated by a laser. Raman scattering from contaminants generates secondary light which is analyzed by spectrometer. Based on Raman scattering analysis, sample cleanliness is determined. Cleaning can be dynamically terminated based on achieving a target cleanliness level or based on prediction thereof. Variations and additional applications are disclosed.
Public/Granted literature
- US20230393074A1 CONCURRENT LASER CLEANING AND SPECTROSCOPIC CLEANLINESS MONITORING Public/Granted day:2023-12-07
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