Invention Application
- Patent Title: METHOD AND APPARATUS FOR NEUTRAL BEAM PROCESSING BASED ON GAS CLUSTER ION BEAM TECHNOLOGY
- Patent Title (中): 基于气体离子束技术的中性光束处理方法与装置
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Application No.: US14571533Application Date: 2014-12-16
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Publication No.: US20150294838A1Publication Date: 2015-10-15
- Inventor: Sean R. Kirkpatrick , Allen R. Kirkpatrick , Michael J. Walsh , Richard C. Svrluga
- Applicant: Sean R. Kirkpatrick , Allen R. Kirkpatrick , Michael J. Walsh , Richard C. Svrluga
- Applicant Address: US MA Billerica
- Assignee: EXOGENESIS CORPORATION
- Current Assignee: EXOGENESIS CORPORATION
- Current Assignee Address: US MA Billerica
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/08 ; H01J37/147 ; H01J37/05
Abstract:
A method of improving the surface of an object treats the surface with a neutral beam formed from a gas cluster ion mean to create a surface texture and/or increase surface area.
Public/Granted literature
- US09799488B2 Method and apparatus for neutral beam processing based on gas cluster ion beam technology Public/Granted day:2017-10-24
Information query
