Invention Publication
- Patent Title: APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
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Application No.: US18392494Application Date: 2023-12-21
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Publication No.: US20240128044A1Publication Date: 2024-04-18
- Inventor: Weiming REN , Xuedong LIU , Xuerang HU , Zhongwei CHEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J37/06 ; H01J37/10 ; H01J37/28

Abstract:
A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
Public/Granted literature
- US12237143B2 Apparatus of plural charged-particle beams Public/Granted day:2025-02-25
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