Invention Grant
- Patent Title: Apparatus and method for forming films
- Patent Title (中): 用于形成薄膜的装置和方法
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Application No.: US524823Application Date: 1995-09-07
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Publication No.: US5935331APublication Date: 1999-08-10
- Inventor: Hiroyuki Naka , Masayoshi Miura , Hiroshi Ogura , Naoko Matsuda
- Applicant: Hiroyuki Naka , Masayoshi Miura , Hiroshi Ogura , Naoko Matsuda
- Applicant Address: JPX Kadoma
- Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee Address: JPX Kadoma
- Priority: JPX6-215954 19940909; JPX7-011729 19950127; JPX7-167214 19950703
- Main IPC: B05B5/025
- IPC: B05B5/025 ; B05B5/03 ; B05B7/06 ; B05B7/08 ; B05B7/24 ; B05B17/06 ; B05C5/02 ; B05C9/14 ; B05C11/02 ; B05C11/06 ; B05C11/08 ; B41J2/01 ; H05K3/12
Abstract:
An apparatus, for forming a film, includes an ink jet head having a plurality of nozzles for discharging a liquid, a rotating device for rotating about a rotary axis a coating-object substrate onto which liquid discharged from the ink jet head is deposited, a relatively moving device for moving the ink jet head and the coating-object substrate relatively to each other between a nearby region of the coating-object substrate near the rotary axis and a separate region of the coating-object substrate separate from the rotary axis, and a relative movement control device for controlling the relatively moving device so that an angular velocity of rotation by the rotating device is reduced responsively as a relative position of the ink jet head and the coating-object substrate therebetween makes relative movement from the nearby region toward the separate region, and an angular velocity of rotation by the rotating device is reduced responsively as the relative position of the ink jet head and the coating-object substrate therebetween moves relatively from the nearby region toward the separate region.
Public/Granted literature
- USD329772S Openwork design for seat backs Public/Granted day:1992-09-29
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