Invention Grant
US08434423B2 Substrate carrying apparatus having circumferential sidewall and substrate processing system 失效
具有圆周侧壁和基板处理系统的基板承载装置

Substrate carrying apparatus having circumferential sidewall and substrate processing system
Abstract:
Disclosed is a substrate carrying apparatus having a simple configuration capable of inhibiting the occurrence of pattern collapse. A carrying tray of the disclosed substrate carrying apparatus includes a bottom plate for supporting the substrate and a circumferential side wall being provided around the bottom plate. An opening is formed in the bottom plate. An elevating member, to and from which the substrate is to be transferred, passes through the opening. A space is temporarily formed in a carrying tray. The elevating member within the opening passes to the outside of the carrying tray through the space. When the substrate is carried, the liquid is reservoired within the carrying tray, and the substrate is carried while the liquid remained on the upper surface of the substrate.
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