Invention Grant
- Patent Title: Ion beam source
- Patent Title (中): 离子束源
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Application No.: US12967304Application Date: 2010-12-14
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Publication No.: US08968535B2Publication Date: 2015-03-03
- Inventor: John MacNeil , Paul George Bennett
- Applicant: John MacNeil , Paul George Bennett
- Applicant Address: GB Newport, Gwent
- Assignee: SPP Process Technology Systems UK Limited
- Current Assignee: SPP Process Technology Systems UK Limited
- Current Assignee Address: GB Newport, Gwent
- Agency: Volentine & Whitt, PLLC
- Main IPC: C23C14/00
- IPC: C23C14/00 ; C25B11/00 ; C25B13/00 ; H01J27/02 ; C23C14/34 ; C23C14/46 ; H01J37/24 ; H01J37/305
Abstract:
This invention relates an ion beam source (10) for use with a non-electrical conducting target (14) including a grid (13) for extracting ions and a power supply for supplying pass power to the grid (13) to extract the ions.
Public/Granted literature
- US20110139605A1 ION BEAM SOURCE Public/Granted day:2011-06-16
Information query
IPC分类:
