Invention Grant
- Patent Title: Memory element with a reactive metal layer
- Patent Title (中): 具有反应性金属层的记忆元件
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Application No.: US14167694Application Date: 2014-01-29
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Publication No.: US09159408B2Publication Date: 2015-10-13
- Inventor: Christophe J. Chevallier , Steve Kuo-Ren Hsia , Wayne Kinney , Steven Longcor , Darrell Rinerson , John Sanchez , Philip F. S. Swab , Edmond R. Ward
- Applicant: Unity Semiconductor Corporation
- Applicant Address: US CA Sunnyvale
- Assignee: UNITY SEMICONDUCTOR CORPORATION
- Current Assignee: UNITY SEMICONDUCTOR CORPORATION
- Current Assignee Address: US CA Sunnyvale
- Agency: Stolowitz Ford Cowger LLP
- Main IPC: H01L45/00
- IPC: H01L45/00 ; G11C13/00 ; G11C11/16 ; G11C11/56 ; H01L27/24

Abstract:
A memory cell including conductive oxide electrodes is disclosed. The memory cell includes a memory element operative to store data as a plurality of resistive states. The memory element includes a layer of a conductive metal oxide (CMO) (e.g., a perovskite) in contact with an electrode that may comprise one or more layers of material. At least one of those layers of material can be a conductive oxide (e.g., a perovskite such as LaSrCoO3-LSCoO or LaNiO3-LNO) that is in contact with the CMO. The conductive oxide layer can be selected as a seed layer operative to provide a good lattice match with and/or a lower crystallization temperature for the CMO. The conductive oxide layer may also be in contact with a metal layer (e.g., Pt). The memory cell additionally exhibits non-linear IV characteristics, which can be favorable in certain arrays, such as non-volatile two-terminal cross-point memory arrays.
Public/Granted literature
- US20140211542A1 Memory Element With a Reactive Metal Layer Public/Granted day:2014-07-31
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