Invention Grant
US09202717B2 Method of making liquid discharge head, liquid discharge head, liquid discharge apparatus having liquid discharge head, and manufacturing apparatus of liquid discharge head 有权
排液头,排液头,具有排液头的排液装置以及排液头的制造装置的制造方法

Method of making liquid discharge head, liquid discharge head, liquid discharge apparatus having liquid discharge head, and manufacturing apparatus of liquid discharge head
Abstract:
A method of making a liquid discharge head which includes a nozzle to discharge liquid, a pressure chamber communicating with the nozzle, a pressure chamber substrate to form surfaces of the pressure chamber, and a piezoelectric actuator to apply pressure to liquid in the pressure chamber having a lower electrode, a ferroelectric film, and an upper electrode, includes a silicon wafer supplying process, a position adjustment process, a surface treatment process to reform a surface of the lower electrode, a liquid applying process to apply ferroelectric precursor on the lower electrode by an inkjet method, a heating process to heat the ferroelectric precursor film, and a cooling process. A series of processes from the position adjustment process to the cooling process is iterated to form a ferroelectric film having a predetermined thickness. The series of processes is performed with certain waiting times inserted between key processes.
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