Invention Grant
- Patent Title: Ion source devices and methods
- Patent Title (中): 离子源设备和方法
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Application No.: US13591291Application Date: 2012-08-22
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Publication No.: US09257285B2Publication Date: 2016-02-09
- Inventor: Frank Goerbing
- Applicant: Frank Goerbing
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Main IPC: H01J17/26
- IPC: H01J17/26 ; H01J61/28 ; H01J1/14 ; H01L21/265 ; H01J37/08 ; H01J37/317 ; H01J27/08

Abstract:
An ion source includes a chamber defining an interior cavity for ionization, an electron beam source at a first end of the interior cavity, an inlet for introducing ionizable gas into the chamber, and an arc slit for extracting ions from the chamber. The chamber includes an electrically conductive ceramic.
Public/Granted literature
- US20140055024A1 ION SOURCE DEVICES AND METHODS Public/Granted day:2014-02-27
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