An apparatus (20) for producing a particle film according to the present invention is an apparatus for producing a particle film by sweeping a meniscus area (5) in a particle dispersion liquid (4) filling a space between a first substrate (1) and a second substrate (2) facing the first substrate (1) and by forming the particle film on the first substrate (1) while evaporating a solvent in the meniscus area (5), including: particle concentration measuring means (3) for measuring a concentration of particles in the meniscus area (5); and particle concentration adjusting means (13) for adjusting the concentration of particles in the meniscus area (5) in accordance with the particle concentration measured by the particle concentration measuring means (3).