Invention Grant
US09449794B2 Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna
有权
具有侧RF馈电和螺旋线圈天线的对称感应耦合等离子体源
- Patent Title: Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna
- Patent Title (中): 具有侧RF馈电和螺旋线圈天线的对称感应耦合等离子体源
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Application No.: US14270578Application Date: 2014-05-06
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Publication No.: US09449794B2Publication Date: 2016-09-20
- Inventor: Andrew Nguyen , Kartik Ramaswamy , Jason A. Kenney , Shahid Rauf , Kenneth S. Collins , Yang Yang , Steven Lane , Yogananda Sarode Vishwanath
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: H01J7/24
- IPC: H01J7/24 ; H01J37/32 ; C23C16/455 ; C23C16/509 ; H05H1/46
Abstract:
A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Public/Granted literature
- US20140232263A1 SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AND SPIRAL COIL ANTENNA Public/Granted day:2014-08-21
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