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公开(公告)号：US10131994B2
公开(公告)日：2018-11-20
申请号：US13666245
申请日：2012-11-01
Applicant: APPLIED MATERIALS, INC.
Inventor： Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Shahid Rauf , James D. Carducci , Douglas A. Buchberger, Jr. , Ankur Agarwal , Jason A. Kenney , Leonid Dorf , Ajit Balakrishna , Richard Fovell
Abstract: A plasma reactor for processing a workpiece includes a reactor chamber having a ceiling and a sidewall and a workpiece support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.
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公开(公告)号：US09928987B2
公开(公告)日：2018-03-27
申请号：US13897592
申请日：2013-05-20
Applicant: APPLIED MATERIALS, INC.
Inventor： Jason A. Kenney , James D. Carducci , Kenneth S. Collins , Richard Fovell , Kartik Ramaswamy , Shahid Rauf
IPC: C23C16/00 , H01L21/306 , H01J37/04 , H01J37/32 , H05H1/46
CPC classification number: H01J37/04 , H01J37/321 , H01J37/3211 , H05H1/46 , H05H2001/4667
Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with RF feeds arranged in equilateral symmetry.
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3.发明申请公开(公告)号：US20170350018A1
公开(公告)日：2017-12-07
申请号：US15685787
申请日：2017-08-24
Applicant: Applied Materials, Inc.
Inventor： Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Shahid Rauf , James D. Carducci , Douglas A. Buchberger , Ankur Agarwal , Jason A. Kenney , Leonid Dorf , Ajit Balakrishna , Richard Fovell
CPC classification number: C23F1/08 , B01J12/002 , C23C14/28 , H01J37/321 , H01J37/3211 , H01J37/32733 , H01J37/32834 , H05H1/46
Abstract: A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.
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4.发明授权Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator 有权三线圈感应耦合等离子体源，具有来自单个RF发电机的单独控制的线圈电流公开(公告)号：US09082591B2
公开(公告)日：2015-07-14
申请号：US13863614
申请日：2013-04-16
Applicant: APPLIED MATERIALS, INC.
Inventor： Leonid Dorf , Shahid Rauf , Jonathan Liu , Jason A. Kenney , Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Steven Lane
CPC classification number: H01J37/32183 , H01J37/32082
Abstract: An inductively coupled plasma reactor has three concentric coil antennas and a current divider circuit individually controlling currents in each of the three coil antennas by varying two variable impedance elements in the current divider circuit in response to a desired current apportionment among the coil antennas received from a user interface.
Abstract translation: 电感耦合等离子体反应器具有三个同心线圈天线和分流器电路，其分别控制三个线圈天线中的每一个中的电流，通过响应于从一个线圈天线接收的线圈天线之间的期望的电流分配，改变分流器电路中的两个可变阻抗元件 用户界面。
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5.发明申请SYMMETRICAL PLURAL-COIL PLASMA SOURCE WITH SIDE RF FEEDS AND RF DISTRIBUTION PLATES 有权具有侧射频馈电和射频分配板的对称双线圈等离子体源公开(公告)号：US20140312766A1
公开(公告)日：2014-10-23
申请号：US14319089
申请日：2014-06-30
Applicant: APPLIED MATERIALS, INC.
Inventor： James D. Carducci , Kenneth S. Collins , Richard Fovell , Jason A. Kenney , Kartik Ramaswamy , Shahid Rauf
IPC: H01J37/32 , C23C16/505
CPC classification number: H01J37/3211 , C23C16/505 , H01J37/32119 , H01J37/32183 , H05H1/46 , H05H2001/4667
Abstract: A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Abstract translation: 等离子体反应器具有具有两个线圈天线的顶部电感耦合等离子体源，并且对称和径向RF馈送以及围绕对称和径向RF馈送的圆柱形RF屏蔽。 径向RF馈送对称地馈送到等离子体源。
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Patent Agency Ranking
6.发明申请SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AND SPIRAL COIL ANTENNA 有权具有射频馈电和螺旋线圈天线的对称电感耦合等离子体源公开(公告)号：US20140232263A1
公开(公告)日：2014-08-21
申请号：US14270578
申请日：2014-05-06
Applicant: APPLIED MATERIALS, INC.
Inventor： Andrew Nguyen , Kartik Ramaswamy , Jason A. Kenney , Shahid Rauf , Kenneth S. Collins , Yang Yang , Steven Lane , Yogananda Sarode Vishwanath
IPC: H01J37/32
CPC classification number: H01J37/3211 , C23C16/45563 , C23C16/509 , H01J37/32174 , H05H1/46 , H05H2001/4667
Abstract: A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Abstract translation: 等离子体反应器具有架空多重线圈天线，包括平行的螺旋线圈天线以及围绕对称和径向射频馈送的对称和径向射频馈送以及圆柱形RF屏蔽。 径向RF馈送对称地馈送到等离子体源。
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公开(公告)号：US20140020839A1
公开(公告)日：2014-01-23
申请号：US13897592
申请日：2013-05-20
Applicant: APPLIED MATERIALS, INC.
Inventor： Jason A. Kenney , James D. Carducci , Kenneth S. Collins , Richard Fovell , Kartik Ramaswamy , Shahid Rauf
IPC: H01J37/04
CPC classification number: H01J37/04 , H01J37/321 , H01J37/3211 , H05H1/46 , H05H2001/4667
Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with RF feeds arranged in equilateral symmetry.
Abstract translation: 等离子体反应器具有架空多线圈感应等离子体源，RF等离子体源以等边对称排列。
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公开(公告)号：US20190085467A1
公开(公告)日：2019-03-21
申请号：US16195670
申请日：2018-11-19
Applicant: Applied Materials, Inc.
Inventor： Andrew Nguyen , Kenneth S. Collins , Kartik Ramaswamy , Shahid Rauf , James D. Carducci , Douglas A. Buchberger, Jr. , Ankur Agarwal , Jason A. Kenney , Leonid Dorf , Ajit Balakrishna , Richard Fovell
Abstract: A plasma reactor for processing a workpiece includes a reactor chamber having a ceiling and a sidewall and a workpiece support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.
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9.发明授权公开(公告)号：US10170279B2
公开(公告)日：2019-01-01
申请号：US14294431
申请日：2014-06-03
Applicant: APPLIED MATERIALS, INC.
Inventor： Jason A. Kenney , James D. Carducci , Kenneth S. Collins , Richard Fovell , Kartik Ramaswamy , Shahid Rauf
IPC: C23C16/00 , H01L21/306 , H01J37/32 , H05H1/46 , C23C16/509
Abstract: A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
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10.发明授权Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna 有权具有侧RF馈电和螺旋线圈天线的对称感应耦合等离子体源公开(公告)号：US09449794B2
公开(公告)日：2016-09-20
申请号：US14270578
申请日：2014-05-06
Applicant: APPLIED MATERIALS, INC.
Inventor： Andrew Nguyen , Kartik Ramaswamy , Jason A. Kenney , Shahid Rauf , Kenneth S. Collins , Yang Yang , Steven Lane , Yogananda Sarode Vishwanath
IPC: H01J7/24 , H01J37/32 , C23C16/455 , C23C16/509 , H05H1/46
CPC classification number: H01J37/3211 , C23C16/45563 , C23C16/509 , H01J37/32174 , H05H1/46 , H05H2001/4667
Abstract: A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Abstract translation: 等离子体反应器具有架空多重线圈天线，包括平行的螺旋线圈天线以及围绕对称和径向射频馈送的对称和径向射频馈送以及圆柱形RF屏蔽。 径向RF馈送对称地馈送到等离子体源。
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