Invention Grant
- Patent Title: Ion beam device and emitter tip adjustment method
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Application No.: US15021350Application Date: 2014-10-08
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Publication No.: US09761407B2Publication Date: 2017-09-12
- Inventor: Hiroyuki Muto , Yoshimi Kawanami , Hiroyasu Shichi , Shinichi Matsubara
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2013-212426 20131010
- International Application: PCT/JP2014/076888 WO 20141008
- International Announcement: WO2015/053301 WO 20150416
- Main IPC: H01J37/26
- IPC: H01J37/26 ; H01J1/304 ; H01J37/08 ; B23K9/00 ; H01J27/26 ; H01J37/147 ; H01J37/18 ; H01J37/285 ; H01J37/30

Abstract:
The objective of the present invention is to provide an ion beam device capable of forming a nanopyramid stably having one atom at the front end of an emitter tip even when the cooling temperature is lowered in order to observe a sample with a high signal-to-noise ratio. In the present invention, the ion beam device, wherein an ion beam generated from an electric field-ionized gas ion source is irradiated onto the sample to observe or process the sample, holds the temperature of the emitter tip at a second temperature higher than a first temperature for generating the ion beam and lower than room temperature, sets the extraction voltage to a second voltage higher than the first voltage used when generating the ion beam, and causes field evaporation of atoms at the front end of the emitter tip, when forming the nanopyramid having one atom at the front end of the emitter tip.
Public/Granted literature
- US20160225575A1 Ion Beam Device and Emitter Tip Adjustment Method Public/Granted day:2016-08-04
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