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Patent Agency Ranking
公开(公告)号：KR101728935B1
公开(公告)日：2017-04-20
申请号：KR1020140030883
申请日：2014-03-17
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/677 , H01L21/67
CPC classification number: H01L21/67781 , G11C11/16 , H01L21/67754
Abstract: 본발명은수직자화방식및 면내자화방식의양 방식의자기어닐링처리를실시할수 있는자기어닐링장치를제공하는것을과제로한다. 이러한자기어닐링장치는, 자계발생수단으로서횡형의초전도자석을이용하여피처리체유지구에유지된피처리체를자기어닐링처리하는자기어닐링장치로서, 자기어닐링처리전의상기피처리체를수납하는수납용기와, 상기수납용기에유지된상기피처리체를상기피처리체유지구에반송하는피처리체반송기구를포함하고, 상기피처리체반송기구는상기피처리체를수평상태로유지가능하며, 수직상태로유지가능한것이다. 또한, 본발명은반도체웨이퍼에의불순물의부착을저감할수 있는자기어닐링장치를제공하는것을과제로한다. 이러한자기어닐링장치는, 자계발생수단으로서횡형의초전도자석을이용하여피처리체를자기어닐링처리하는자기어닐링장치로서, 상기피처리체를유지할수 있는피처리체유지구와, 상기피처리체를수납하는수납용기와, 상기피처리체유지구의사이에서상기피처리체를반송하는피처리체반송기구와, 상기피처리체유지구에유지된상기피처리체를상기자계발생수단내에트랜스퍼하는트랜스퍼기구와, 청정가스를도입하는청정가스도입수단과, 청정가스를배기하는배기수단을포함하고, 상기청정가스도입수단과상기배기수단에의해형성되는상기청정가스의플로우방향은상기피처리체유지구에유지되는상기피처리체의주표면에평행한것이다.
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公开(公告)号：KR1020160104601A
公开(公告)日：2016-09-05
申请号：KR1020160107688
申请日：2016-08-24
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/67 , H01L21/677 , F27B5/06 , F27B5/12 , F27B5/13 , F27D3/00 , F27D11/12 , F27D19/00 , C21D1/04
CPC classification number: H01L39/02 , C21D1/04 , C21D2281/00 , F27B5/06 , F27B5/12 , F27B5/13 , F27D3/0024 , F27D3/0084 , F27D11/12 , F27D19/00 , F27D2003/0003 , F27D2003/0018 , G11C11/16 , H01L43/12 , H01L21/67098 , H01L21/67754 , H01L21/67781
Abstract: 본발명은다수매의웨이퍼를연속적으로처리할수 있는자기어닐링장치를제공하는것을과제로한다. 이러한자기어닐링장치는, 한그룹의피처리체를수납한수납용기를반송하는수납용기반송영역과, 상기피처리체를반송하는피처리체반송영역이개폐도어를사이에두고형성되고, 제어부를갖는자기어닐링장치로서, 상기수납용기반송영역에는, 이자기어닐링장치에반입되는수납용기를배치하는제1 배치대와, 상기개폐도어를통해상기수납용기반송영역으로부터상기피처리체반송영역으로기밀하게상기피처리체를반송하기위해상기수납용기를배치하는복수의제2 배치대와, 복수의상기수납용기를보관하는보관부와, 상기제1 배치대, 상기제2 배치대및 상기보관부사이에서상기수납용기를반출입하는수납용기반송기구가배치되며, 상기피처리체반송영역에는, 복수의상기피처리체의위치맞춤을행하는얼라이너와, 복수그룹의상기피처리체를유지할수 있는피처리체유지구와, 상기제2 배치대에배치된수납용기, 상기얼라이너및 상기피처리체유지구의사이에서상기피처리체를반송하는피처리체반송기구와, 상기피처리체를가열하는가열수단과, 상기피처리체에자계를인가하는횡형초전도자석을갖는자계발생수단과, 상기피처리체유지구에유지된상기피처리체를상기자계발생수단내로트랜스퍼하는트랜스퍼기구가배치된것이다. 또한, 본발명은효율적으로웨이퍼를자기어닐링장치로반입할수 있는자기어닐링장치를제공하는것을과제로한다. 이러한자기어닐링장치는, 자계발생수단으로서횡형의초전도자석을이용하여, 피처리체를자기어닐링처리하는자기어닐링장치로서, 상기피처리체를유지할수 있는피처리체유지구와, 상기피처리체를수납하는수납용기와상기피처리체유지구의사이에서상기피처리체를반송하는피처리체반송기구와, 상기피처리체유지구에접속부를통해접속되고, 상기피처리체를상기피처리체반송기구로반송할때의제1 위치와, 상기피처리체를자기어닐링처리할때의제2 위치와의사이에서, 상기피처리체유지구를트랜스퍼할수 있는트랜스퍼기구를구비하고, 상기접속부는, 상기피처리체유지구의경사각을조절할수 있는각도조절부를갖는것이다.
Abstract translation: 本发明提供了连续处理多个晶片的磁性退火装置。 磁退火装置包括：接收容器返回区域，其返回接收一组待处理材料的接收容器; 退回材料的退料区; 以及控制部，其中通过在其间留下开闭门来形成接收容器返回区域和材料返回区域。 第一配置部分，多个第二配置部分，用于存储多个接收容器的存储部分和接收容器返回装置布置在接收容器返回区域中。 对准器，材料保持器，布置在第二布置部分中的接收容器，材料返回装置，加热单元，具有水平超导磁体的磁场产生单元，以及用于将材料转移到磁体内部的转移装置 场发生单元布置在材料返回区域中。
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公开(公告)号：KR1020140115991A
公开(公告)日：2014-10-01
申请号：KR1020140030881
申请日：2014-03-17
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/67 , H01L21/677 , F27B5/06 , F27B5/12 , F27B5/13 , F27D3/00 , F27D11/12 , F27D19/00 , C21D1/04
CPC classification number: H01L39/02 , C21D1/04 , C21D2281/00 , F27B5/06 , F27B5/12 , F27B5/13 , F27D3/0024 , F27D3/0084 , F27D11/12 , F27D19/00 , F27D2003/0003 , F27D2003/0018 , G11C11/16 , H01L43/12 , H01L21/67098 , H01L21/67754 , H01L21/67781
Abstract: The present invention provides a magnetic annealing apparatus capable of continuously processing a plurality of wafer sheets. The magnetic annealing apparatus includes a carrier conveyance region which carries a carrier which receives workpieces to be processed of one group, a workpiece conveyance region which carries the workpieces to be processed, and a control unit. An opening and closing door is interposed between the carrier conveyance region and the workpiece conveyance region. According to an embodiment of the present invention, the wafer is efficiently inputted to the magnetic annealing apparatus.
Abstract translation: 本发明提供能够连续处理多个晶片片的磁性退火装置。 磁性退火装置包括：载体搬运区域，承载承载待加工的一个工件的承载件;承载待处理工件的工件输送区域;以及控制单元。 打开和关闭门介于载体输送区域和工件输送区域之间。 根据本发明的实施例，晶片被有效地输入到磁性退火装置。
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公开(公告)号：KR1020160111003A
公开(公告)日：2016-09-23
申请号：KR1020167023012
申请日：2015-01-12
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L43/12 , H01L21/324 , H01L43/02
CPC classification number: H01L43/12 , H01L21/324 , H01L43/02
Abstract: 어닐링시스템에서워크피스의에칭-후어닐링을수행하는방법이기재된다. 구체적으로, 방법은, 어닐링시스템에하나이상의워크피스를배치하는단계를포함하며, 하나이상의워크피스의각각은셀 임계치수(CD)에의해특성화된전자디바이스를형성하도록에칭프로세스시퀀스를사용하여패터닝된박막의다층스택을가지며, 박막의다층스택은자기재료를함유한적어도하나의패터닝된층을포함한다. 그후에, 하나이상의워크피스상의자기재료를함유한패터닝된층은어닐링프로세스조건을통하여어닐링시스템에서어닐링되며, 어닐링프로세스조건은자기재료를함유한패터닝된층의특성을조정하도록선택된다.
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公开(公告)号：KR1020140115992A
公开(公告)日：2014-10-01
申请号：KR1020140030883
申请日：2014-03-17
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/677 , H01L21/67
CPC classification number: H01L21/67781 , G11C11/16 , H01L21/67754 , H01L21/67098
Abstract: An objective of the present invention is to provide a magnetic annealing apparatus capable of performing magnetic annealing process of two methods including a perpendicular magnetization method and an in-plane magnetization method. The magnetic annealing apparatus magnetic-anneals a workpiece maintained in a processed body maintenance member using a flat type superconducting magnet as a magnetic field generation unit. The magnetic annealing apparatus includes: a receiving container to receive the workpiece before magnetic annealing process; and a workpiece conveyance mechanism to convey the workpieces held in the receiving container to the workpiece maintenance member. The workpiece conveyance mechanism may hold the workpieces in a horizontal state or in a vertical state. Further, an objective of the present invention is to provide a magnetic annealing apparatus capable of reducing attaching of impurities to a semiconductor wafer. The magnetic annealing apparatus magnetic-anneals a workpiece maintained in a processed body maintenance member using a flat type superconducting magnet as a magnetic field generation unit. The magnetic annealing apparatus includes: a workpiece maintenance member capable of maintaining the workpieces; a receiving container to receive the workpiece; a workpiece conveyance mechanism to convey the workpieces between workpiece maintenance members; a transfer mechanism to transfer the workpiece held in the workpiece maintenance member in the magnetic field generation unit; a clean gas introducing unit to introduce clean gas; and an exhaust unit to exhaust the clean gas. A flow direction of the clean gas formed by the clean gas introducing unit and the exhaust unit is parallel to main surfaces of the workpiece held in the workpiece maintenance member.
Abstract translation: 本发明的目的是提供一种能够进行包括垂直磁化法和平面内磁化法的两种方法的磁退火处理的磁性退火装置。 磁退火装置使用扁平型超导磁体作为磁场产生单元来使维持在加工体维护构件中的工件退磁。 磁退火装置包括：接收容器，用于在磁退火处理之前接收工件; 以及工件输送机构，其将保持在容纳容器中的工件输送到工件维修部件。 工件传送机构可以将工件保持在水平状态或垂直状态。 此外，本发明的目的是提供能够减少杂质附着到半导体晶片的磁性退火装置。 磁退火装置使用扁平型超导磁体作为磁场产生单元来使维持在加工体维护构件中的工件退磁。 磁性退火装置包括：能够维持工件的工件维护部件; 用于接收工件的接收容器; 工件输送机构，用于在工件维修部件之间输送工件; 传递机构，用于将保持在工件维护部件中的工件传送到磁场产生单元; 清洁气体引入单元引入清洁气体; 以及用于排出清洁气体的排气单元。 由清洁气体引入单元和排气单元形成的清洁气体的流动方向平行于保持在工件维护构件中的工件的主表面。
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